Nā Mea Hoʻolako Kiʻekiʻe Kina Carbon Tetrafluoride CF4 Electronic Gas

Wehewehe Pōkole:


Nā kikoʻī huahana

Nā Lepili Huahana

Ma muli o ka lawelawe maikaʻi, nā ʻano huahana kiʻekiʻe like ʻole, nā kumukūʻai hoʻokūkū a me ka hoʻouna pono ʻana, hauʻoli mākou i kahi inoa maikaʻi i waena o kā mākou mea kūʻai aku. He hui ikaika mākou me ka mākeke ākea no nā mea hoʻolako kiʻekiʻeKina Carbon Tetrafluoride CF4E ke Kinoea Uila, e hilinaʻi mai iā mākou a e loaʻa iā ʻoe nā mea hou aku. E ʻoluʻolu e hele mai e hoʻokaʻaʻike mai iā mākou no ka ʻike hou aku, ke hōʻoiaʻiʻo nei mākou iā ʻoe i ko mākou ʻike maikaʻi loa i nā manawa a pau.
ma muli o ka lawelawe maikaʻi, nā ʻano huahana kiʻekiʻe like ʻole, nā kumukūʻai hoʻokūkū a me ka hoʻouna pono ʻana, hauʻoli mākou i kahi inoa maikaʻi i waena o kā mākou mea kūʻai aku. He hui ikaika mākou me ka mākeke ākea noCF4, Kina Carbon Tetrafluoride, Ke hana mau nei mākou i nā ʻenehana hou e hoʻomaʻamaʻa i ka hana ʻana, a hoʻolako i nā waiwai me nā kumukūʻai hoʻokūkū a me ke kūlana kiʻekiʻe! ʻO ka ʻoluʻolu o ka mea kūʻai aku kā mākou mea nui! Hiki iā ʻoe ke ʻae iā mākou e ʻike i kou manaʻo e hoʻomohala i kahi hoʻolālā kū hoʻokahi no kāu kumu hoʻohālike ponoʻī e pale aku i nā ʻāpana like ʻole ma ka mākeke! E hāʻawi mākou i kā mākou lawelawe maikaʻi loa e hoʻokō i kāu mau pono āpau! E hōʻoia e hoʻokaʻaʻike koke mai iā mākou!

Nā Palena ʻenehana

Nā kikoʻī 99.999%
ʻOkikene+ʻArgon ≤1ppm
Naikokene ≤4 ppm
Ka makū (H2O) ≤3 ppm
HF ≤0.1 ppm
CO ≤0.1 ppm
CO2 ≤1 ppm
SF6 ≤1 ppm
Nā Halocarbynes ≤1 ppm
Nā mea haumia āpau ≤10 ppm

ʻO ke kalapona tetrafluoride kahi hydrocarbon halogenated me ke ʻano kemika CF4. Hiki ke manaʻo ʻia he hydrocarbon halogenated, methane halogenated, perfluorocarbon, a i ʻole he hui inorganic. ʻO ke kalapona tetrafluoride kahi kinoea ʻaʻohe kala a ʻala ʻole, hoʻoheheʻe ʻole ʻia i ka wai, hoʻoheheʻe ʻia i ka benzene a me ka chloroform. Paʻa ma lalo o ka mahana maʻamau a me ke kaomi, pale i nā oxidants ikaika, nā mea lapalapa a i ʻole nā ​​mea hiki ke puhi. ʻO ke kinoea ʻaʻole hiki ke puhi, e hoʻonui ʻia ke kaomi o loko o ka pahu ke hōʻike ʻia i ka wela kiʻekiʻe, a aia kahi pilikia o ka haki a me ka pahū. He paʻa kemika a ʻaʻole hiki ke lapalapa. ʻO ka mea hana metala ammonia-sodium wai wale nō ke hana ma ka mahana o ka lumi. ʻO ke kalapona tetrafluoride kahi kinoea e hoʻoulu ai i ka hopena ʻōmaʻomaʻo. He paʻa loa ia, hiki ke noho i ka lewa no ka manawa lōʻihi, a he kinoea ʻōmaʻomaʻo ikaika loa. Hoʻohana ʻia ke kalapona tetrafluoride i ke kaʻina hana etching plasma o nā kaapuni hoʻohui like ʻole. Hoʻohana ʻia hoʻi ia ma ke ʻano he kinoea laser, a hoʻohana ʻia i loko o nā refrigerants haʻahaʻa haʻahaʻa, nā solvents, nā lubricants, nā mea hoʻokaʻawale, a me nā coolants no nā mea ʻike infrared. ʻO ia ka kinoea etching plasma i hoʻohana nui ʻia ma ka ʻoihana microelectronics. He hui ia o ke kinoea tetrafluoromethane kiʻekiʻe-purity a me ke kinoea tetrafluoromethane kiʻekiʻe-purity a me ka oxygen kiʻekiʻe-purity. Hiki ke hoʻohana nui ʻia i loko o ka silicon, silicon dioxide, silicon nitride, a me ke aniani phosphosilicate. Hoʻohana nui ʻia ka etching o nā mea ʻili lahilahi e like me ka tungsten a me ka tungsten i ka hoʻomaʻemaʻe ʻili o nā mea uila, ka hana ʻana o nā cell solar, ka ʻenehana laser, ka refrigeration haʻahaʻa haʻahaʻa, ka nānā ʻana i ka leak, a me ka detergent i ka hana ʻana o nā kaapuni paʻi. Hoʻohana ʻia ma ke ʻano he refrigerant haʻahaʻa haʻahaʻa a me ka ʻenehana etching maloʻo plasma no nā kaapuni i hoʻohui ʻia. Nā palekana no ka mālama ʻana: E mālama i loko o kahi hale kūʻai kinoea anuanu, ventilated, ʻaʻole hiki ke puhi. E mālama mai ke ahi a me nā kumu wela. ʻAʻole pono e ʻoi aku ka mahana o ka mālama ʻana ma mua o 30°C. Pono e mālama ʻokoʻa ʻia mai nā mea ʻā maʻalahi (hiki ke puhi) a me nā mea hoʻoheheʻe ʻia, a pale i ka mālama ʻana i nā mea like ʻole. Pono e hoʻolako ʻia kahi mālama me nā lako hana lapaʻau ulia pōpilikia liki.

Noi:

① Mea hoʻomaʻalili:

I kekahi manawa hoʻohana ʻia ʻo Tetrafluoromethane ma ke ʻano he refrigerant haʻahaʻa haʻahaʻa.

  fdrgr ʻO Greg

② Ke kālai ʻana:

Hoʻohana ʻia ia i ka hana microhana uila wale nō a i ʻole i ka hui pū ʻana me ka oxygen ma ke ʻano he plasma etchant no ka silicon, silicon dioxide, a me ka silicon nitride.

dsgre rgg

Pūʻolo maʻamau:

Huahana Kāpona Tetrafluoride CF4
Ka nui o ka pūʻolo Paukū 40Ltr Paukū 50Ltr  
Hoʻopiha i ke kaumaha ʻupena/Cyl 30Kgs 38Kgs  
Ka nui i hoʻouka ʻia i loko o ka ipu 20' 250 Cyls 250 Cyls
Kaumaha ʻupena holoʻokoʻa 7.5 Tons 9.5 Tons
Kaumaha Tare o ka paukūʻolokaʻa 50Kgs 55Kgs
Kiwikā CGA 580

Pōmaikaʻi:

①High maemae, hale hou loa;

②Mea hana palapala hōʻoia ISO;

③Hoʻouna wikiwiki;

ʻŌnaehana loiloi pūnaewele no ka kaohi maikaʻi i kēlā me kēia ʻanuʻu;

⑤Kūpono kiʻekiʻe a me ke kaʻina hana meticulous no ka lawelawe ʻana i ka cylinder ma mua o ka hoʻopiha ʻana;Ma muli o ka lawelawe maikaʻi, nā ʻano huahana kiʻekiʻe like ʻole, nā kumukūʻai hoʻokūkū a me ka hoʻouna pono ʻana, hauʻoli mākou i kahi inoa maikaʻi i waena o kā mākou mea kūʻai aku. He hui ikaika mākou me ka mākeke ākea no nā mea hoʻolako kiʻekiʻeKina Carbon TetrafluorideCF4 Electronic Gas, e hilinaʻi mai iā mākou a e loaʻa iā ʻoe nā mea hou aku. E ʻoluʻolu e hele mai e hoʻokaʻaʻike mai iā mākou no ka ʻike hou aku, ke hōʻoiaʻiʻo nei mākou iā ʻoe i ko mākou ʻike maikaʻi loa i nā manawa a pau.
Nā Mea Hoʻolako Kiʻekiʻe Kina Carbon Tetrafluoride, CF4, Ke hana mau nei mākou i nā ʻenehana hou e hoʻomaʻamaʻa i ka hana ʻana, a hoʻolako i nā waiwai me nā kumukūʻai hoʻokūkū a me ke kūlana kiʻekiʻe! ʻO ka ʻoluʻolu o ka mea kūʻai aku kā mākou mea nui! Hiki iā ʻoe ke ʻae iā mākou e ʻike i kou manaʻo e hoʻomohala i kahi hoʻolālā kū hoʻokahi no kāu kumu hoʻohālike ponoʻī e pale aku i nā ʻāpana like ʻole ma ka mākeke! E hāʻawi mākou i kā mākou lawelawe maikaʻi loa e hoʻokō i kāu mau pono āpau! E hōʻoia e hoʻokaʻaʻike koke mai iā mākou!


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