Nā kinoea kūikawā
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Sulfur Tetrafluoride (SF4)
EINECS NO: 232-013-4
NO KA KAUA: 7783-60-0 -
Nitrous Oxide (N2O)
ʻO Nitrous oxide, ʻike ʻia hoʻi ʻo ke kinoea ʻakaʻaka, he kemika weliweli me ke ʻano kemika N2O. He kinoea kala ʻole, ʻala ʻono. ʻO ka N2O kahi mea hoʻoheheʻe hiki ke kākoʻo i ka puhi ʻana ma lalo o kekahi mau kūlana, akā paʻa i ka lumi wela a loaʻa kahi hopena anesthetic liʻiliʻi. , a hiki ke hoʻohenehene i nā kānaka. -
Carbon Tetrafluoride (CF4)
ʻO ka carbon tetrafluoride, ʻike ʻia hoʻi ʻo tetrafluoromethane, he kinoea kala ʻole i ka mahana maʻamau a me ke kaomi, hiki ʻole ke hoʻoheheʻe ʻia i ka wai. ʻO ke kinoea CF4 i kēia manawa ka mea hoʻohana nui loa i ka plasma etching gas i ka ʻoihana microelectronics. Hoʻohana ʻia ia e like me ke kinoea laser, cryogenic refrigerant, solvent, lubricant, insulating material, a me ka coolant no nā paipu ʻike infrared. -
Sulfuryl Fluoride (F2O2S)
ʻO Sulfuryl fluoride SO2F2, kinoea ʻawaʻawa, hoʻohana nui ʻia ma ke ʻano he insecticide. No ka mea ʻo ka sulfuryl fluoride nā hiʻohiʻona o ka diffusion ikaika a me ka permeability, broad-spectrum insecticide, haʻahaʻa haʻahaʻa, haʻahaʻa haʻahaʻa haʻahaʻa, wikiwiki insecticidal wikiwiki, manawa pōkole pōkole, hoʻohana maʻalahi i ka haʻahaʻa haʻahaʻa, ʻaʻohe hopena i ka helu germination a me ka haʻahaʻa haʻahaʻa. Hoʻohana nui ʻia ia i loko o nā hale kūʻai, nā moku ukana, nā hale, nā pahu wai, nā pale pale, etc. -
Silane (SiH4)
ʻO Silane SiH4 he kinoea hoʻopaʻa ʻole, ʻawaʻawa a ikaika loa i ka mahana maʻamau a me ke kaomi. Hoʻohana nui ʻia ʻo Silane i ka ulu ʻana o ka epitaxial o ke silika, nā mea maka no ka polysilicon, silicon oxide, silicon nitride, a me nā mea ʻē aʻe. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, hoʻomaʻemaʻe kinoea: 99.999%, hoʻohana pinepine ʻia e like me ka meaʻai aerosol propellant a me ke kinoea medium. Hoʻohana pinepine ʻia i ka semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition), hoʻohana ʻia ʻo C4F8 ma ke ʻano he pani no CF4 a i ʻole C2F6, hoʻohana ʻia e like me ka hoʻomaʻemaʻe kinoea a me ke kaʻina semiconductor etching gas. -
Nitric Oxide (NO)
ʻO ke kinoea Nitric oxide he hui ia o ka nitrogen me ke kumu kemika NO. He kinoea kala ʻole, ʻala ʻole, ʻawaʻawa ʻaʻole hiki ke hoʻoheheʻe ʻia i ka wai. ʻO ka nitric oxide he mea kemika loa a hoʻopili me ka oxygen e hana i ke kinoea kinoea nitrogen dioxide (NO₂). -
ʻO ke Klorida (HCl)
He kinoea kala ʻole ka HCL Gas Hydrogen chloride me ka ʻala ʻala. Kapa ʻia kona ʻano wai wai ka waika hydrochloric. Hoʻohana nui ʻia ka Hydrogen chloride no ka hana ʻana i nā kala, nā mea ʻala, nā lāʻau lapaʻau, nā chlorides like ʻole a me nā mea hoʻopiʻi corrosion. -
Hexafluoropropylene (C3F6)
Hexafluoropropylene, kumu hoʻohālike kemika: C3F6, he kinoea kala ʻole i ka mahana maʻamau a me ke kaomi. Hoʻohana nui ʻia ia e hoʻomākaukau i nā huahana kemika maikaʻi i loko o ka fluorine, nā lāʻau lapaʻau waena, nā mea hoʻopau ahi, a me nā mea ʻē aʻe, a hiki ke hoʻohana ʻia e hoʻomākaukau i nā mea polymer fluorine. -
ʻAmonia (NH3)
ʻO ka ammonia wai / ammonia anhydrous he mea waiwai nui ia me ka nui o nā noi. Hiki ke hoʻohana ʻia ka ammonia wai e like me ka refrigerant. Hoʻohana nui ʻia e hana i ka waikawa nitric, urea a me nā mea kanu kemika ʻē aʻe, a hiki ke hoʻohana ʻia i mea maka no ka lāʻau lapaʻau a me nā pesticides. I ka ʻoihana pale, hoʻohana ʻia ia e hana i nā propellants no nā rockets a me nā missiles.
