Nā Kinoea Kūikawā
-
ʻO ka Sulfur Tetrafluoride (SF4)
EINECS NO: 232-013-4
Helu CAS: 7783-60-0 -
ʻOkika Nitrous (N2O)
ʻO ka nitrous oxide, i ʻike ʻia hoʻi he kinoea ʻakaʻaka, he kemika weliweli me ke ʻano kemika N2O. He kinoea ʻala ʻole ia, ʻono. He oxidant ka N2O e hiki ke kākoʻo i ka puhi ʻana ma lalo o kekahi mau kūlana, akā paʻa i ka mahana o ka lumi a he hopena anesthetic iki. , a hiki ke hoʻomākeʻaka i nā kānaka. -
Kāpona Tetrafluoride (CF4)
ʻO ke kalapona tetrafluoride, i ʻike ʻia hoʻi ʻo tetrafluoromethane, he kinoea kala ʻole ia ma ka mahana a me ke kaomi maʻamau, ʻaʻole hiki ke hoʻoheheʻe ʻia i ka wai. ʻO ke kinoea CF4 ka kinoea etching plasma i hoʻohana nui ʻia i kēia manawa ma ka ʻoihana microelectronics. Hoʻohana ʻia hoʻi ia ma ke ʻano he kinoea laser, refrigerant cryogenic, solvent, lubricant, insulating material, a me coolant no nā paipu ʻike infrared. -
ʻO ka Sulfuryl Fluoride (F2O2S)
ʻO ka sulfuryl fluoride SO2F2, ke kinoea make, hoʻohana nui ʻia e like me ka insecticide. No ka mea, he ʻano hoʻolaha ikaika a me ka permeability ka sulfuryl fluoride, ka insecticide ākea ākea, ka dosage haʻahaʻa, ka nui o ke koena haʻahaʻa, ka wikiwiki o ka insecticidal, ka manawa hoʻopuehu kinoea pōkole, ka hoʻohana kūpono i ka mahana haʻahaʻa, ʻaʻohe hopena i ka nui o ka germination a me ka haʻahaʻa o ka toxicity, ʻoi aku ka nui o ka hoʻohana ʻia ʻana i nā hale kūʻai, nā moku ukana, nā hale, nā pā wai waihona, ka pale ʻana i nā termite, a pēlā aku. -
Silane (SiH4)
He kinoea i hoʻopaʻa ʻia ʻole ke kala, ʻawahia a hana nui ʻo Silane SiH4 ma ka mahana maʻamau a me ke kaomi. Hoʻohana nui ʻia ʻo Silane i ka ulu ʻana o ka silicon epitaxial, nā mea maka no ka polysilicon, silicon oxide, silicon nitride, a me nā mea ʻē aʻe, nā cell solar, nā fiber optical, ka hana ʻana i ke aniani kala, a me ka waiho ʻana o ka mahu kemika. -
ʻOkafluorocyclobutane (C4F8)
ʻO Octafluorocyclobutane C4F8, ka maʻemaʻe kinoea: 99.999%, hoʻohana pinepine ʻia e like me ka mea hoʻouluulu aerosol meaʻai a me ke kinoea waena. Hoʻohana pinepine ʻia ia i ke kaʻina hana semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition), hoʻohana ʻia ʻo C4F8 ma ke ʻano he pani no CF4 a i ʻole C2F6, hoʻohana ʻia e like me ke kinoea hoʻomaʻemaʻe a me ke kinoea etching kaʻina hana semiconductor. -
ʻOkika Nitric (NO)
ʻO ke kinoea nitric oxide kahi hui o ka naikokene me ke ʻano kemika NO. He kinoea ʻawahia ʻole ia, ʻala ʻole, makehewa i hoʻoheheʻe ʻole ʻia i ka wai. He pane kemika loa ka nitric oxide a pane pū me ka oxygen e hana i ke kinoea ʻino nitrogen dioxide (NO₂). -
ʻO ka Hydrogen Chloride (HCl)
He kinoea kala ʻole ke kinoea hydrogen chloride HCL me kahi ʻala ʻawaʻawa. Ua kapa ʻia kona wai hoʻoheheʻe ʻia he hydrochloric acid, i ʻike ʻia hoʻi he hydrochloric acid. Hoʻohana nui ʻia ka hydrogen chloride e hana i nā kala, nā mea ʻala, nā lāʻau lapaʻau, nā chloride like ʻole a me nā mea pale i ka palaho. -
ʻO ka Hexafluoropropylene (C3F6)
ʻO Hexafluoropropylene, ke ʻano kemika: C3F6, he kinoea kala ʻole ia ma ka mahana a me ke kaomi maʻamau. Hoʻohana nui ʻia ia e hoʻomākaukau i nā huahana kemika maikaʻi like ʻole me ka fluorine, nā mea waena lāʻau lapaʻau, nā mea kinai ahi, a me nā mea ʻē aʻe, a hiki ke hoʻohana ʻia e hoʻomākaukau i nā mea polymer me ka fluorine. -
ʻAmonia (NH3)
He mea maka kemika koʻikoʻi ka ammonia wai / ammonia anhydrous me nā ʻano hana like ʻole. Hiki ke hoʻohana ʻia ka ammonia wai ma ke ʻano he refrigerant. Hoʻohana nui ʻia ia e hana i ka waikawa nitric, urea a me nā mea hoʻouluulu kemika ʻē aʻe, a hiki ke hoʻohana ʻia ma ke ʻano he mea maka no nā lāʻau lapaʻau a me nā pesticides. I ka ʻoihana pale kaua, hoʻohana ʻia ia e hana i nā propellants no nā rockets a me nā missiles.
