Nā huahana
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Oxygen (O2)
He kinoea kala ʻole a ʻala ʻole ka oxygen. ʻO ia ke ʻano mea maʻamau o ka oxygen. E pili ana i ka ʻenehana, lawe ʻia ka oxygen mai ke kaʻina liquefaction o ka ea, a ʻo ka oxygen i ka lewa e pili ana i 21%. He kinoea kala ʻole a ʻala ʻole ka Oxygen me ke ʻano kemika O2, ʻo ia ke ʻano mea maʻamau o ka oxygen. ʻO ka helu hoʻoheheʻe -218.4°C, a ʻo ka helu hoʻolapalapa -183°C. ʻAʻole hiki ke hoʻoheheʻe ʻia i ka wai. Ma kahi o 30mL o ka oxygen i hoʻoheheʻe ʻia i ka 1L o ka wai, a ʻo ka wai oxygen he uliuli. -
Sulfur Dioxide (SO2)
ʻO ka Sulfur dioxide (sulfur dioxide) ka mea maʻamau, maʻalahi, a me ka hoʻonāukiuki ʻana i ka sulfur oxide me ke ʻano kemika SO2. ʻO ka sulfur dioxide he kinoea waihoʻoluʻu a ʻākala me ka ʻala ʻala. Hiki ke hoʻoheheʻe ʻia i ka wai, ethanol a me ka etera, ʻano paʻa ka wai sulfur dioxide, ʻaʻohe hana, ʻaʻole hiki ke puhi ʻia, ʻaʻole i hana i kahi hui pahū me ka ea. Loaʻa i ka sulfur dioxide nā waiwai bleaching. Hoʻohana mau ʻia ka sulfur dioxide i ka ʻoihana e hoʻomaʻemaʻe i ka pulp, ka hulu hipa, ka siliki, nā pāpale mauʻu, a me nā mea ʻē aʻe. -
Ethylene Oxide (ETO)
ʻO ka Ethylene oxide kekahi o nā ether cyclic maʻalahi. He hui heterocyclic ia. ʻO C2H4O kona ʻano kemika. He mea make kino make a he mea waiwai nui ka petrochemical. ʻO nā waiwai kemika o ka ethylene oxide he ikaika loa. Hiki iā ia ke hoʻohui i nā pane hoʻohui pū me nā pūhui he nui a hiki ke hōʻemi i ka nitrate kālā. -
1,3 Butadiene (C4H6)
ʻO ka 1,3-Butadiene he mea hoʻohuihui mea ola me kahi ʻano kemika o C4H6. He kinoea kala ʻole me kahi ʻala ʻala liʻiliʻi a maʻalahi hoʻi e liquefy. He liʻiliʻi ka meaʻawaʻawa a ua like kona ʻona me ka ethylene, akā ua ikaika ka huhū i ka ʻili a me nā mucous membrane, a he hopena anesthetic i nā kiʻekiʻe kiʻekiʻe. -
Hūhā (H2)
Loaʻa i ka Hydrogen kahi ʻano kemika o H2 a me ke kaumaha molekala o 2.01588. Ma lalo o ka wela a me ke kaomi maʻamau, he kinoea ʻaʻa loa ia, ʻaʻohe waihoʻoluʻu, aniani, ʻono a ʻono ʻole i paʻakikī ke hoʻoheheʻe ʻia i loko o ka wai, a ʻaʻole e hoʻopili me ka nui o nā mea. -
Neon (ʻAʻole)
ʻO Neon he kinoea kala ʻole, ʻaʻala ʻole, ʻaʻole hiki ke puhi ʻia me kahi ʻano kemika o Ne. ʻO ka maʻamau, hiki ke hoʻohana ʻia ka neon e like me ka hoʻopiha piha ʻana i nā kukui neon kala no nā hōʻike hoʻolaha hoʻolaha waho, a hiki ke hoʻohana ʻia no nā hōʻailona kukui ʻike a me ka hoʻoponopono uila. A me nā mea hui kinoea laser. Hiki ke hoʻohana ʻia nā kinoea hanohano e like me Neon, Krypton a me Xenon e hoʻopiha i nā huahana aniani e hoʻomaikaʻi i kā lākou hana a i ʻole hana. -
Carbon Tetrafluoride (CF4)
ʻO ka carbon tetrafluoride, ʻike ʻia hoʻi ʻo tetrafluoromethane, he kinoea kala ʻole i ka mahana maʻamau a me ke kaomi, hiki ʻole ke hoʻoheheʻe ʻia i ka wai. ʻO ke kinoea CF4 i kēia manawa ka mea hoʻohana nui loa i ka plasma etching gas i ka ʻoihana microelectronics. Hoʻohana ʻia ia e like me ke kinoea laser, cryogenic refrigerant, solvent, lubricant, insulating material, a me ka coolant no nā paipu ʻike infrared. -
Sulfuryl Fluoride (F2O2S)
ʻO Sulfuryl fluoride SO2F2, kinoea ʻawaʻawa, hoʻohana nui ʻia ma ke ʻano he insecticide. No ka mea ʻo ka sulfuryl fluoride nā hiʻohiʻona o ka diffusion ikaika a me ka permeability, broad-spectrum insecticide, haʻahaʻa haʻahaʻa, haʻahaʻa haʻahaʻa haʻahaʻa, wikiwiki insecticidal wikiwiki, manawa pōkole pōkole, hoʻohana maʻalahi i ka haʻahaʻa haʻahaʻa, ʻaʻohe hopena i ka helu germination a me ka haʻahaʻa haʻahaʻa. Hoʻohana nui ʻia ia i loko o nā hale kūʻai, nā moku ukana, nā hale, nā pahu wai, nā pale pale, etc. -
Silane (SiH4)
ʻO Silane SiH4 he kinoea hoʻopaʻa ʻole, ʻawaʻawa a ikaika loa i ka mahana maʻamau a me ke kaomi. Hoʻohana nui ʻia ʻo Silane i ka ulu ʻana o ka epitaxial o ke silika, nā mea maka no ka polysilicon, silicon oxide, silicon nitride, a me nā mea ʻē aʻe. -
Octafluorocyclobutane (C4F8)
Octafluorocyclobutane C4F8, hoʻomaʻemaʻe kinoea: 99.999%, hoʻohana pinepine ʻia e like me ka meaʻai aerosol propellant a me ke kinoea medium. Hoʻohana pinepine ʻia i ka semiconductor PECVD (Plasma Enhance. Chemical Vapor deposition), hoʻohana ʻia ʻo C4F8 ma ke ʻano he pani no CF4 a i ʻole C2F6, hoʻohana ʻia e like me ka hoʻomaʻemaʻe kinoea a me ke kaʻina semiconductor etching gas. -
Nitric Oxide (NO)
ʻO ke kinoea Nitric oxide he hui ia o ka nitrogen me ke kumu kemika NO. He kinoea kala ʻole, ʻala ʻole, ʻawaʻawa ʻaʻole hiki ke hoʻoheheʻe ʻia i ka wai. ʻO ka nitric oxide he mea kemika loa a hoʻopili me ka oxygen e hana i ke kinoea kinoea nitrogen dioxide (NO₂). -
ʻO ke Klorida (HCl)
He kinoea kala ʻole ka HCL Gas Hydrogen chloride me ka ʻala ʻala. Kapa ʻia kona ʻano wai wai ka waika hydrochloric. Hoʻohana nui ʻia ka Hydrogen chloride no ka hana ʻana i nā kala, nā mea ʻala, nā lāʻau lapaʻau, nā chlorides like ʻole a me nā mea hoʻopiʻi corrosion.
