Ināʻaʻoleʻoe eʻike i keʻano o ke kinoea pono e hoʻohana ai no ka hana, loaʻa iā mākou kaʻenehanaʻenehana loea no ka 3months manuahi manuahi pūnaewele.
Ināʻaʻoleʻoe eʻike i ka hoʻomaʻemaʻe pono e kohoʻoe, e hoʻouna mākou iāʻoe i nā'āpana maʻemaʻe āpau no kāu'ōlelo, a hana i kahi manaʻo.
Inā makemakeʻoe i ka pepa liʻiliʻi, hiki iā mākou ke hāʻawi i lalo o ka canlinder ma lalo o ka canlinder 10litter; Inā makemakeʻoe i ka pākeke nui, hiki iā mākou ke hāʻawi i ka drum drum or iso tank. ʻO kou koho āpau.
Inā makemakeʻoe e kūʻai i nāʻanoʻano likeʻole i hoʻokahi mau pahu. ʻO ka manaʻo maikaʻi, hiki i kēia ala ke mālama iāʻoe iho i ke kumukūʻai hoʻouna. Hāʻawi kā mākou hui i kahi kokoke i 99% mauʻano o nā mīkini i ka mākeke. Ināʻaʻole hiki iāʻoe ke loaʻa i nā kiko'ī kiko'ī, eʻoluʻolu eʻoluʻolu e hoʻouna iā mākou i kahi nīnau.
Ināʻoʻoe ka manawa mua e hoʻopuka ai i ke kino, mai hopohopo. Loaʻa iā mākou nā hui logistic pristics no ke kōkua.and i loaʻa iā mākou iho i nā mea lawe kaʻa kaʻa e kākoʻo ana i ka mea kūʻai aku i ka mea kūʻai aku.
Hana '★Ināʻoe he mea hoʻohana i hoʻopauʻia, e hoʻouna i ka nīnau nīnau i Tyqt
Hana '★Inā he mea kālepa waena, e hoʻouna i ka nīnau nīnau i Tyqt
Hana '★Inā he huiʻoʻoe, e hoʻouna i ka nīnau nīnau i Tyqt
Hana '★Ināʻoe he mea kūʻai aku, e hoʻouna i ka nīnau nīnau i Tyqt
| ʻO nā wahiʻai | C'4, C2H2, CO, |
| ʻO nā haunaele | AR-He, AR-H2, AR-O-C2, OE-He-He-he-n2, |
| Nā wai wai | C2H4, S2, CO2, No2, N2, N2O, H2S, H2S, HLC3, BF3, BF3, BF3, BF3, BF3, BF3 |
| ʻO nā kīʻaha calibration | CH4-N2,ʻaʻohe-N2, H2, H2-N2, SF6-N2, SFH4-N2, SIH4-N2, SIH4-N2, SIH4-N2, SIH4-N2, SIH4-N2, SIH4-N2, SIH4-N2, SIH4-N2, SIH4-N2, SIH4-N2, SIH4-N2, SIH4-N2, SHI4-NO |
| ʻO nā kiʻina doping | ʻO Ash3, PH3, GEH4, B2H6, ASF3, ASF3, H HPS, BFL3, |
| Ka uluʻana o ka lā | Seri4, SihcL3, chipc4, B2H6, Gl3, AmH3, GIL |
| ʻO ka wai hau etching | CL2, HCL, HF, HFB, sf6 |
| Plasma etching | Sif4, cf4, c 22f8, CHF3, C2fi6, NF3, SF6, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, NF3, n2, N2, N2, N2, N2, P2, N2, N2, N2, as ia |
| Ion Beam Etching | C3f8, Chlē Chlp3, CCLF3, CF4 |
| Ion Promlantation | Asf3, PF3, pH3, BF3, BF3, BCL3, SF6, SF6, H2, H2 |
| Nā GVD GATES | ʻO Sih4, SiH2Cl2, TicL4, NH3, NH3,ʻaʻohe, O2 |
| Nā'ōwili | N2,ʻOu,ʻo ia, h2, cok, N2O, O2 |
| ʻO nā kiʻina doping | ʻO Seri4, Kanaka iā SicL4, SI2H6, HCL, H12, B2H, N2, H2 |
