He aha nā kinoea etching maʻamau i ka etching maloʻo?

ʻO ka ʻenehana etching maloʻo kekahi o nā kaʻina hana nui. ʻO ke kinoea etching maloʻo kahi mea nui i ka hana semiconductor a me kahi kumu kinoea koʻikoʻi no ka etching plasma. Hoʻopili pololei kāna hana i ka maikaʻi a me ka hana o ka huahana hope. Hōʻike nui kēia ʻatikala i nā kinoea etching maʻamau i hoʻohana ʻia i ke kaʻina etching maloʻo.

Nā kinoea ma muli o ka fluorine: e like mekalapona tetrafluoride (CF4), hexafluoroethane (C2F6), trifluoromethane (CHF3) a me ka perfluoropropane (C3F8). Hiki i kēia mau kinoea ke hoʻopuka maikaʻi i nā fluoride volatile i ka wā e hoʻoheheʻe ai i ka silika a me nā pūhui silika, a laila e loaʻa ai ka wehe ʻana i nā mea.

ʻO nā kinoea ma muli o ka chlorine: e like me ka chlorine (Cl2),boron trichloride (BCl3)a me ka silika tetrachloride (SiCl4). Hiki i nā kinoea hoʻokumu ke klorine ke hāʻawi i nā ion chloride i ke kaʻina hana etching, e kōkua ana i ka hoʻomaikaʻi ʻana i ka helu etching a me ke koho.

Nā kinoea ma muli o ka bromine: e like me ka bromine (Br2) a me ka bromine iodide (IBr). Hiki i nā kinoea ma Bromine ke hāʻawi i ka hana etching ʻoi aku ka maikaʻi ma kekahi mau kaʻina etching, ʻoi aku hoʻi i ka wā e huki ai i nā mea paʻakikī e like me ka silicon carbide.

Nā kinoea ma muli o ka nitrogen a me ka oxygen: e like me ka nitrogen trifluoride (NF3) a me ka oxygen (O2). Hoʻohana mau ʻia kēia mau kinoea no ka hoʻoponopono ʻana i nā ʻano hopena i ke kaʻina hana etching e hoʻomaikaʻi i ke koho a me ka kuhikuhi ʻana o ka etching.

Loaʻa kēia mau kinoea i ka etching pololei o ka ʻili waiwai ma o ka hui pū ʻana o ka sputtering kino a me nā hopena kemika i ka wā etching plasma. ʻO ke koho o ke kinoea etching e pili ana i ke ʻano o ka mea e etched, nā koi koho o ka etching, a me ka helu etching makemake.