ʻO kaʻenehana maloʻo maloʻo kekahi o nā kaʻina kī. ʻO ka mīkini maloʻo maloʻo kahi mea nui i ka hana semiconductor e hana ai a me kahi kumu nui no ka plasma. Hoʻokomoʻia kāna hana i ka maikaʻi a me ka hana o ka huahana hope loa. ʻO kēiaʻatikala ka mea nui loa i nā mea maʻamau i hoʻohanaʻia ma keʻano o ke kaʻina hana ma ka maloʻo maloʻo.
ʻO nā slues e pili ana i ka fluorineCarbon TETRAFFLUORD (CF4), hexaflurooethane (c2f6), trifluortomaetthane Hiki i kēia mau kāmaʻa ke hana maikaʻi i ka fluropiver collaties i ka wā e like me keʻano silicon a me nā silini silitic
ʻO nā galani-chlorineboron trichiride (bcl3)a me Sillicon Terachloride (sicl4). Hiki i nā hui cliplose-e pono ke hāʻawi i nā huaʻala hepoka i ka wā o ke kaʻina Etching, e kōkua e hoʻomaikaʻi i ka helu etching a me ke kali.
Nā GIMINE-PERSET ENTER: E like me ka Bromine (Br2) a me Bromine Iodide (IBR). Hiki i nā mea hana uila i kohoʻia e pili ana i ka hana e like me ka hanaʻana i nā kaʻina e like me keʻano o nā hana paʻakikī e like me ka carbid silk
Nā galani e pili ana a me nā gexigenigen-oxygen Hoʻohana pinepineʻia kēia mau pahu i nā kūlana kūpono i ke kaʻina hana etching e hoʻomaikaʻi i ke koho a me ke kuhikuhiʻana o keʻano.
ʻO kēia mau mea e hoʻokō pololei ana i ka etching etching o nā mea e like me ka huiʻana o keʻano o keʻano o ka lehulehu. ʻO ke koho o ka pahuhopu etching e pili ana i keʻano o nā mea e komo ai,ʻo ke koiʻana o nā koho koho, a me ka noi makemake etching.
Post Time: Feb-08-2025
