ʻO nā kinoea uila kūikawā i loaʻa ka fluorine maʻamau e komo pū mesulfur hexafluoride (SF6), tungsten hexafluoride (WF6),kalapona tetrafluoride (CF4), trifluoromethane (CHF3), nitrogen trifluoride (NF3), hexafluoroethane (C2F6) a me octafluoropropane (C3F8).
Me ka hoʻomohala ʻana o ka nanotechnology a me ka hoʻomohala nui ʻana o ka ʻoihana uila, e piʻi aʻe kona koi i kēlā me kēia lā. ʻO ka Nitrogen trifluoride, ma ke ʻano he kinoea uila kūikawā pono ʻole a hoʻohana nui ʻia i ka hana ʻana a me ka hana ʻana o nā panela a me nā semiconductors, he ākea ka mākeke.
Ma ke ʻano he ʻano kinoea kūikawā i loaʻa ka fluorine,naikokene trifluoride (NF3)ʻO ia ka huahana kinoea kūikawā uila me ka mana mākeke nui loa. He inert kemika ia ma ka mahana o ka lumi, ʻoi aku ka ikaika ma mua o ka oxygen ma ke ana wela kiʻekiʻe, ʻoi aku ka paʻa ma mua o ka fluorine, a maʻalahi hoʻi e lawelawe. Hoʻohana nui ʻia ka Nitrogen trifluoride ma ke ʻano he kinoea etching plasma a me kahi mea hoʻomaʻemaʻe keʻena hopena, a kūpono no nā kahua hana o nā ʻāpana semiconductor, nā hōʻikeʻike panel pālahalaha, nā fiber optical, nā cell photovoltaic, a pēlā aku.
Ke hoʻohālikelike ʻia me nā kinoea uila ʻē aʻe i loaʻa ka fluorine,naikokene trifluorideLoaʻa iā ia nā pono o ka pane wikiwiki a me ka pono kiʻekiʻe. ʻOi loa i ka etching o nā mea i loaʻa ka silicon e like me ka silicon nitride, he kiʻekiʻe kona helu etching a me ke koho ʻana, ʻaʻohe koena e waiho ana ma luna o ka ʻili o ka mea i etched ʻia. He mea hoʻomaʻemaʻe maikaʻi loa nō hoʻi a ʻaʻohe haumia i ka ʻili, hiki ke hoʻokō i nā pono o ke kaʻina hana.
Ka manawa hoʻouna: Sep-14-2024
