Loaʻa nā kinoea uila kūikawā i loko o ka fluorinesulfur hexafluoride (SF6), tungsten hexafluoride (WF6),kalapona tetrafluoride (CF4), trifluoromethane (CHF3), nitrogen trifluoride (NF3), hexafluoroethane (C2F6) a me octafluoropropane (C3F8).
Me ka hoʻomohala ʻana o ka nanotechnology a me ka hoʻomohala nui o ka ʻoihana uila, e hoʻonui ʻia kāna koi i kēlā me kēia lā. ʻO Nitrogen trifluoride, ma ke ʻano he kinoea uila kūikawā nui loa i hoʻohana ʻia i ka hana ʻana a me ka hana ʻana o nā panela a me nā semiconductor, he ākea ākea ākea.
Ma ke ʻano he ʻano kinoea kūikawā i loko o ka fluorine,naikokene trifluoride (NF3)ʻo ia ka huahana kinoea uila kūikawā me ka nui o ka mākeke mākeke. He kemika inert ma ka lumi wela, ʻoi aku ka ikaika ma mua o ka oxygen ma ke kiʻekiʻe wela, ʻoi aku ka paʻa ma mua o ka fluorine, a maʻalahi ke mālama. Hoʻohana nui ʻia ʻo Nitrogen trifluoride e like me ke kinoea etching plasma a me kahi mea hoʻomaʻemaʻe keʻena hoʻomaʻemaʻe, a he kūpono ia no ka hana ʻana i nā kīʻaha semiconductor chips, nā hōʻike papa pālahalaha, nā fiber optical, nā kiʻi photovoltaic, etc.
Hoʻohālikelike ʻia me nā kinoea uila e loaʻa i ka fluorine,naikokene trifluorideloaʻa nā pōmaikaʻi o ka wikiwiki wikiwiki a me ka hana kiʻekiʻe. ʻOi loa i ka etching o ka silicon-i loko o nā mea e like me ka silicon nitride, he kiʻekiʻe etching rate a me ka selectivity, e waiho ole koena ma ka ili o ka etched mea. He mea hoʻomaʻemaʻe maikaʻi loa ia a ʻaʻohe haumia i ka ʻili, hiki ke hoʻokō i nā pono o ke kaʻina hana.
Ka manawa hoʻouna: Sep-14-2024
