ʻO ka nui loa o ke kinoea kūikawā uila - Nitrogen Trifluoride NF3

Mālama ka ʻoihana semiconductor o kā mākou ʻāina a me ka ʻoihana panel i kahi kiʻekiʻe o ka pōmaikaʻi. ʻO ka Nitrogen trifluoride, he mea koʻikoʻi a nui loa ka nui o ke kinoea uila kūikawā i ka hana ʻana a me ka hana ʻana o nā panela a me nā semiconductors, he wahi ākea ākea.

ʻO nā kinoea uila kūikawā i hoʻohana mau ʻia me ka fluorinesulfur hexafluoride (SF6), tungsten hexafluoride (WF6),kalapona tetrafluoride (CF4), trifluoromethane (CHF3), nitrogen trifluoride (NF3), hexafluoroethane (C2F6) a me octafluoropropane (C3F8). Hoʻohana nui ʻia ka Nitrogen trifluoride (NF3) ma ke ʻano he kumu fluorine no ka hydrogen fluoride-fluoride gas high-energy chemical lasers. Hiki ke hoʻokuʻu ʻia ka ʻāpana maikaʻi (ma kahi o 25%) o ka ikehu pane ma waena o H2-O2 a me F2 e ka radiation laser, no laila, ʻo nā lasers HF-OF ka mea hoʻohiki maikaʻi loa ma waena o nā laser kemika.

ʻO Nitrogen trifluoride kahi kinoea etching plasma maikaʻi loa i ka ʻoihana microelectronics. No ka etching silicon a me silicon nitride, ʻoi aku ka nui o ka etching rate a me ke koho ʻana o ka nitrogen trifluoride ma mua o ka carbon tetrafluoride a me ka hui ʻana o ka carbon tetrafluoride a me ka oxygen, ʻaʻohe pollution i ka ʻili. ʻOi loa i ka etching o ka integrated circuit mea me ka mānoanoa o emi ma lalo o 1.5um, nitrogen trifluoride i ka maikaʻi loa etching rate a me ka selectivity, waiho ole koena ma luna o ka ili o ka etched mea, a he maikai loa hoʻomaʻemaʻe mea. Me ka hoʻomohala ʻana o ka nanotechnology a me ka hoʻomohala nui o ka ʻoihana uila, e hoʻonui ʻia kāna koi i kēlā me kēia lā.

Ma ke ʻano he kinoea kūikawā i loko o ka fluorine, nitrogen trifluoride (NF3) ka huahana kinoea kūikawā nui loa ma ka mākeke. He kemika inert ma ka lumi wela, ʻoi aku ka ikaika ma mua o ka oxygen, ʻoi aku ka paʻa ma mua o ka fluorine, a maʻalahi hoʻi e mālama i ka wela kiʻekiʻe.

Hoʻohana nui ʻia ʻo Nitrogen trifluoride e like me ka plasma etching gas a me ka hoʻomaʻemaʻe keʻena hoʻomaʻemaʻe, kūpono no ka hana ʻana i nā māla e like me nā semiconductor chips, nā hōʻike papa pālahalaha, nā fibers optical, nā kiʻi photovoltaic, etc.

Ke hoʻohālikelike ʻia me nā kinoea uila e loaʻa ana i ka fluorine, ʻoi aku ka maikaʻi o ka nitrogen trifluoride i ka wikiwiki wikiwiki a me ka hana kiʻekiʻe, ʻoi aku ka maikaʻi o ka etching o nā mea i loko o ka silicon e like me ka silicon nitride, he kiʻekiʻe etching rate a me ke koho, ʻaʻohe koena ma luna o ka ʻili o ka mea i kālai ʻia, a he mea hoʻomaʻemaʻe maikaʻi loa hoʻi, a he mea hoʻomaʻemaʻe maikaʻi loa ia, a ʻaʻole hiki ke hoʻokō i ka pono o ka ʻili.