ʻO ka nui loa o ke kinoea kūikawā uila - Nitrogen Trifluoride NF3

Mālama ka ʻoihana semiconductor a me ka ʻoihana panel o ko mākou ʻāina i kahi pae kiʻekiʻe o ka pōmaikaʻi. ʻO ka Nitrogen trifluoride, ma ke ʻano he kinoea uila kūikawā pono loa a nui loa i ka hana ʻana a me ka hana ʻana o nā panela a me nā semiconductors, he ākea ka mākeke.

ʻO nā kinoea uila kūikawā i loaʻa ka fluorine i hoʻohana pinepine ʻiasulfur hexafluoride (SF6), tungsten hexafluoride (WF6),kalapona tetrafluoride (CF4), trifluoromethane (CHF3), nitrogen trifluoride (NF3), hexafluoroethane (C2F6) a me octafluoropropane (C3F8). Hoʻohana nui ʻia ka nitrogen trifluoride (NF3) ma ke ʻano he kumu fluorine no nā lasers kemika ikehu kiʻekiʻe o ke kinoea hydrogen fluoride-fluoride. Hiki ke hoʻokuʻu ʻia ka ʻāpana kūpono (ma kahi o 25%) o ka ikehu hopena ma waena o H2-O2 a me F2 e ka radiation laser, no laila ʻo nā lasers HF-OF nā lasers hoʻohiki nui loa i waena o nā lasers kemika.

He kinoea etching plasma maikaʻi loa ka Nitrogen trifluoride i ka ʻoihana microelectronics. No ke etching silicon a me ka silicon nitride, ʻoi aku ka kiʻekiʻe o ka etching a me ke koho ʻana o ka nitrogen trifluoride ma mua o ke carbon tetrafluoride a me ka hui ʻana o ke carbon tetrafluoride a me ka oxygen, a ʻaʻohe haumia i ka ʻili. ʻOi loa i ka etching o nā mea kaapuni i hoʻohui ʻia me ka mānoanoa ma lalo o 1.5um, loaʻa i ka nitrogen trifluoride kahi helu etching maikaʻi loa a me ke koho ʻana, ʻaʻohe koena ma ka ʻili o ka mea i etch ʻia, a he mea hoʻomaʻemaʻe maikaʻi loa hoʻi. Me ka hoʻomohala ʻana o ka nanotechnology a me ka hoʻomohala nui ʻana o ka ʻoihana uila, e hoʻonui ʻia kona koi i kēlā me kēia lā.

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Ma ke ʻano he ʻano kinoea kūikawā i loaʻa ka fluorine, ʻo ka nitrogen trifluoride (NF3) ka huahana kinoea kūikawā uila nui loa ma ka mākeke. He inert kemika ia ma ka mahana o ka lumi, ʻoi aku ka hana ma mua o ka oxygen, ʻoi aku ka paʻa ma mua o ka fluorine, a maʻalahi hoʻi e lawelawe ma ka mahana kiʻekiʻe.

Hoʻohana nui ʻia ka Nitrogen trifluoride ma ke ʻano he kinoea etching plasma a me ka mea hoʻomaʻemaʻe keʻena hana, kūpono no nā kahua hana e like me nā ʻāpana semiconductor, nā hōʻikeʻike panela pālahalaha, nā fiber optical, nā cell photovoltaic, a pēlā aku.

Ke hoʻohālikelike ʻia me nā kinoea uila ʻē aʻe i loaʻa ka fluorine, loaʻa i ka nitrogen trifluoride nā pono o ka pane wikiwiki a me ka hana kiʻekiʻe, ʻoi aku hoʻi i ka etching o nā mea i loaʻa ka silicon e like me ka silicon nitride, he kiʻekiʻe kona helu etching a me ke koho ʻana, ʻaʻohe koena ma luna o ka mea i etched ʻia, a he mea hoʻomaʻemaʻe maikaʻi loa hoʻi, ʻaʻole ia e haumia i ka ʻili a hiki ke hoʻokō i nā pono o ke kaʻina hana.


Ka manawa hoʻouna: Dec-26-2024