Hoʻohana nui ʻia ke kinoea laser no ka annealing laser a me ke kinoea lithography i ka ʻoihana uila. ʻO ka pōmaikaʻi mai ka hana hou o nā pale kelepona kelepona a me ka hoʻonui ʻana i nā wahi noi, e hoʻonui hou ʻia ka nui o ka mākeke polysilicon haʻahaʻa haʻahaʻa, a ua hoʻomaikaʻi maikaʻi ke kaʻina hana laser annealing i ka hana o TFT. Ma waena o nā kinoea neon, fluorine, a me argon i hoʻohana ʻia i ka ArF excimer laser no ka hana ʻana i nā semiconductor, ʻoi aku ka neon ma mua o 96% o ka hui kinoea laser. Me ka hoʻomaʻemaʻe ʻana o ka ʻenehana semiconductor, ua hoʻonui ʻia ka hoʻohana ʻana i nā laser excimer, a ʻo ka hoʻokomo ʻana o ka ʻenehana hōʻike pālua ua alakaʻi i ka piʻi nui o ka koi no ke kinoea neon i hoʻopau ʻia e nā laser excimer ArF. Loaʻa ka pōmaikaʻi mai ka hoʻolaha ʻana i ka localization o nā kinoea kūikawā uila, ʻoi aku ka maikaʻi o ka ulu ʻana o ka mākeke i ka wā e hiki mai ana.
ʻO ka mīkini lithography ka mea nui o ka hana semiconductor. Hōʻike ka Lithography i ka nui o nā transistors. ʻO ka hoʻomohala hui ʻana o ke kaulahao ʻoihana lithography ke kī i ka holomua o ka mīkini lithography. ʻO nā mea semiconductor kūpono e like me photoresist, photolithography gas, photomask, a me ka uhi ʻana a me ka hoʻomohala ʻana i nā mea hana he ʻenehana kiʻekiʻe. ʻO ke kinoea lithography ke kinoea a ka mīkini lithography e hoʻopuka i ka laser ultraviolet hohonu. Hiki i nā kinoea lithography like ʻole ke hana i nā kumu māmā o nā lōʻihi nalu like ʻole, a pili pono ko lākou nalu i ka hoʻonā ʻana o ka mīkini lithography, ʻo ia kekahi o nā kumu o ka mīkini lithography. I ka makahiki 2020, ʻo ka huina o ke ao holoʻokoʻa o nā mīkini lithography he 413 mau ʻāpana, kahi i kūʻai aku ai ʻo ASML he 258 mau ʻāpana no 62%, kūʻai aku ʻo Canon he 122 mau ʻāpana no 30%, a ʻo Nikon kūʻai aku he 33 mau ʻāpana no 8%.
Ka manawa hoʻouna: ʻOkakopa-15-2021