Kinoea laser

Hoʻohana nui ʻia ke kinoea laser no ka hoʻoheheʻe laser a me ke kinoea lithography i ka ʻoihana uila. Ma muli o ka hoʻomohala hou ʻana o nā pale kelepona paʻalima a me ka hoʻonui ʻana o nā wahi noi, e hoʻonui hou ʻia ka nui o ka mākeke polysilicon haʻahaʻa haʻahaʻa, a ua hoʻomaikaʻi nui ke kaʻina hana hoʻoheheʻe laser i ka hana o nā TFT. Ma waena o nā kinoea neon, fluorine, a me argon i hoʻohana ʻia i ka laser excimer ArF no ka hana ʻana i nā semiconductors, ʻoi aku ka nui o ka neon ma mua o 96% o ka hui ʻana o ke kinoea laser. Me ka hoʻomaʻemaʻe ʻana o ka ʻenehana semiconductor, ua hoʻonui ʻia ka hoʻohana ʻana i nā lasers excimer, a ua alakaʻi ka hoʻolauna ʻana o ka ʻenehana hōʻike pālua i ka hoʻonui nui ʻana o ke koi no ke kinoea neon i hoʻopau ʻia e nā lasers excimer ArF. Ma muli o ka hoʻolaha ʻana i ka localization o nā kinoea kūikawā uila, e loaʻa i nā mea hana kūloko kahi wahi ulu mākeke maikaʻi aʻe i ka wā e hiki mai ana.

ʻO ka mīkini Lithography ka lako hana nui o ka hana semiconductor. Hoʻākāka ka Lithography i ka nui o nā transistors. ʻO ka hoʻomohala hoʻonohonoho ʻana o ke kaulahao ʻoihana lithography ke kī i ka holomua o ka mīkini lithography. ʻO nā mea semiconductor e like me ka photoresist, ke kinoea photolithography, photomask, a me nā lako hana uhi a me ka hoʻomohala ʻana he ʻike ʻenehana kiʻekiʻe. ʻO ke kinoea Lithography ke kinoea e hoʻopuka ai ka mīkini lithography i ka laser ultraviolet hohonu. Hiki i nā kinoea lithography like ʻole ke hana i nā kumu kukui o nā nalu like ʻole, a ʻo ko lākou nalu e pili pono ana i ka hoʻonā o ka mīkini lithography, ʻo ia kekahi o nā kumu o ka mīkini lithography. I ka makahiki 2020, ʻo ka huina kūʻai honua o nā mīkini lithography he 413 mau ʻāpana, nona nā kūʻai aku ASML 258 mau ʻāpana i helu ʻia he 62%, ʻo Canon kūʻai aku 122 mau ʻāpana i helu ʻia he 30%, a ʻo Nikon kūʻai aku 33 mau ʻāpana i helu ʻia he 8%.