Nā kinoea kūikawāʻokoʻa mai ka laulānā kinoea ʻoihanama ke ʻano he hoʻohana kūikawā ko lākou a hoʻohana ʻia ma nā kahua kikoʻī. Loaʻa iā lākou nā koi kikoʻī no ka maʻemaʻe, ka nui o ka haumia, ka haku mele ʻana, a me nā waiwai kino a me nā kemika. Ke hoʻohālikelike ʻia me nā kinoea ʻoihana, ʻoi aku ka ʻokoʻa o nā ʻano kinoea kūikawā akā he liʻiliʻi ka nui o ka hana a me ke kūʻai aku.

ʻO kanā kinoea i hui pū ʻiaa menā kinoea hoʻoponopono maʻamauʻO nā ʻāpana koʻikoʻi o nā kinoea kūikawā a mākou e hoʻohana pinepine ai. Hoʻokaʻawale pinepine ʻia nā kinoea i hui ʻia i nā kinoea i hui pū ʻia maʻamau a me nā kinoea i hui pū ʻia e nā mea uila.

ʻO nā kinoea i hui pū ʻia ma ke ʻano laulā:kinoea i hui pū ʻia me ka laser, ʻike mea hana i ke kinoea hui ʻia, kuʻihao kinoea hui ʻia, mālama ʻana i ke kinoea hui ʻia, kumu kukui uila i hui ʻia, noiʻi lapaʻau a me ke olaola i hui ʻia ke kinoea, disinfection a me ka sterilization i hui ʻia ke kinoea, mea hana i hui ʻia ke kinoea hui ʻia, kinoea hui kiʻekiʻe-kaomi, a me ka ea ʻole-papa.

ʻO nā hui kinoea uila e komo pū me nā hui kinoea epitaxial, nā hui kinoea hoʻokaʻawale mahu kemika, nā hui kinoea doping, nā hui kinoea etching, a me nā hui kinoea uila ʻē aʻe. He kuleana koʻikoʻi kēia mau hui kinoea i nā ʻoihana semiconductor a me microelectronics a hoʻohana nui ʻia i ka hana kaapuni hoʻohui nui (LSI) a me ka hana kaapuni hoʻohui nui loa (VLSI), a me ka hana ʻana i nā hāmeʻa semiconductor.

5 ʻO nā ʻano kinoea i hui pū ʻia e nā mea uila ka mea i hoʻohana pinepine ʻia

Ke hoʻohuihui ʻana i ke kinoea i hui ʻia

I ka hana ʻana o nā mea semiconductor a me nā kaapuni i hoʻohui ʻia, ua hoʻokomo ʻia kekahi mau haumia i loko o nā mea semiconductor e hāʻawi i ka conductivity a me ka resistivity i makemake ʻia, e hiki ai ke hana i nā resistors, PN junctions, buried layers, a me nā mea ʻē aʻe. ʻO nā kinoea i hoʻohana ʻia i ke kaʻina hana doping ua kapa ʻia he mau kinoea dopant. ʻO kēia mau kinoea ka mea nui e komo pū me ka arsine, phosphine, phosphorus trifluoride, phosphorus pentafluoride, arsenic trifluoride, arsenic pentafluoride,boron trifluoride, a me diborane. Hoʻohui pinepine ʻia ke kumu dopant me kahi kinoea lawe (e like me ka argon a me ka naikokene) i loko o kahi keʻena kumu. A laila hoʻokomo mau ʻia ke kinoea i hui ʻia i loko o kahi umu hoʻolaha a kaʻapuni a puni ka wafer, e waiho ana i ka dopant ma luna o ka ʻili wafer. A laila hana ka dopant me ka silicon e hana i kahi metala dopant e neʻe ana i loko o ka silicon.

Ka hui ʻana o ke kinoea ulu epitaxial

ʻO ka ulu ʻana o ka epitaxial ke kaʻina hana o ka waiho ʻana a me ka ulu ʻana o kahi mea kristal hoʻokahi ma luna o kahi substrate. I loko o ka ʻoihana semiconductor, ʻo nā kinoea i hoʻohana ʻia e ulu i hoʻokahi a ʻoi aku paha nā papa o nā mea me ka hoʻohana ʻana i ka chemical vapor deposition (CVD) ma kahi substrate i koho pono ʻia ua kapa ʻia ʻo epitaxial gases. ʻO nā kinoea silicon epitaxial maʻamau e komo pū me ka dihydrogen dichlorosilane, silicon tetrachloride, a me ka silane. Hoʻohana nui ʻia lākou no ka epitaxial silicon deposition, polycrystalline silicon deposition, silicon oxide film deposition, silicon nitride film deposition, a me ka amorphous silicon film deposition no nā cell solar a me nā mea hana photosensitive ʻē aʻe.

Kinoea hoʻokomo ion

I loko o nā mea hana semiconductor a me ka hana ʻana o ka kaapuni hoʻohui ʻia, ʻo nā kinoea i hoʻohana ʻia i ke kaʻina hana hoʻokomo ion ua kapa ʻia ʻo ia he mau kinoea hoʻokomo ion. Hoʻolalelale ʻia nā mea haumia ionized (e like me ka boron, phosphorus, a me nā ion arsenic) i kahi pae ikehu kiʻekiʻe ma mua o ke hoʻokomo ʻia ʻana i loko o ka substrate. Hoʻohana nui ʻia ka ʻenehana hoʻokomo ion e kāohi i ka volta paepae. Hiki ke hoʻoholo ʻia ka nui o nā mea haumia i hoʻokomo ʻia ma ke ana ʻana i ke au kukuna ion. ʻO nā kinoea hoʻokomo ion e komo pū me ka phosphorus, arsenic, a me nā kinoea boron.

Ke kālai ʻana i ke kinoea i hui pū ʻia

ʻO ke kālai ʻana ke kaʻina hana o ke kālai ʻana i ka ʻili i hana ʻia (e like me ka ʻili metala, ka ʻili silicon oxide, a pēlā aku) ma luna o ke substrate i uhi ʻole ʻia e ka photoresist, me ka mālama ʻana i ka ʻāpana i uhi ʻia e ka photoresist, i mea e loaʻa ai ke ʻano kiʻi e pono ai ma ka ʻili o ke substrate.

Hoʻohuihui Kinoea Hoʻoheheʻe Kemika

Hoʻohana ka Chemical vapor deposition (CVD) i nā hui volatile e waiho i kahi mea hoʻokahi a hui paha ma o kahi hopena kemika vapor-phase. He ʻano hana ʻoniʻoni kēia e hoʻohana ana i nā hopena kemika vapor-phase. ʻOkoʻa nā kinoea CVD i hoʻohana ʻia ma muli o ke ʻano o ka ʻoniʻoni e hana ʻia ana.