Nā kinoea kūikawāʻokoʻa mai ka laulānā kinoea ʻenehanai ka loaʻa ʻana o nā hoʻohana kūikawā a hoʻohana ʻia i nā kahua kikoʻī. Loaʻa iā lākou nā koi kikoʻī no ka maʻemaʻe, ka ʻike haumia, ka haku mele ʻana, a me nā waiwai kino a me nā kemika. Ke hoʻohālikelike ʻia me nā kinoea ʻenehana, ʻoi aku ka ʻokoʻa o nā kinoea kūikawā i nā ʻano like ʻole akā he liʻiliʻi ka liʻiliʻi o ka hana a me nā puke kūʻai.

ʻO kakinoea huikauanā kinoea calibration maʻamauʻO ka mea maʻamau mākou e hoʻohana ai he mau mea nui o nā kinoea kūikawā. Hoʻokaʻawale pinepine ʻia nā kinoea i hui pū ʻia i nā kinoea hui pū ʻia a me nā kinoea huila uila.

ʻO nā kinoea i hui pū ʻia me:kinoea huila laser, mea hana ike kinoea huikau, kuʻi kinoea huikau, mālama kinoea huikau, uila punawai huikau kinoea, lāʻau lapaʻau a me ka biological noiʻi huikau kinoea, disinfection a sterilization hui kinoea, mea kani alarm hui kinoea, kiʻekiʻe-pressure hui kinoea, a me ka ole-grade ea.

Loaʻa i nā hui kinoea uila nā hui kinoea epitaxial, nā hui kinoea deposition chemical, nā hui kinoea doping, nā hui kinoea etching, a me nā hui kinoea uila ʻē aʻe. He kuleana koʻikoʻi kēia mau huila kinoea i ka ʻoihana semiconductor a me ka microelectronics a hoʻohana nui ʻia i ka nui-scale integrated circuit (LSI) a me ka nui-scale integrated circuit (VLSI) hana, a me ka hana ʻana i nā mea hana semiconductor.

5 ʻO nā ʻano kinoea huila uila ka mea maʻamau i hoʻohana ʻia

Doping kinoea huikau

I ka hana ʻana i nā mea hana semiconductor a me nā kaapuni i hoʻohui ʻia, ua hoʻokomo ʻia kekahi mau mea haumia i loko o nā mea semiconductor e hāʻawi i ka conductivity a me ka resistivity i makemake ʻia, e hiki ai i ka hana ʻana i nā resistors, junctions PN, nā papa kanu, a me nā mea ʻē aʻe. Ua kapa ʻia nā kinoea i hoʻohana ʻia i ke kaʻina hana doping. ʻO kēia mau kinoea nui ka arsenic, phosphine, phosphorus trifluoride, phosphorus pentafluoride, arsenic trifluoride, arsenic pentafluoride,boron trifluoride, a me ka diborane. Hoʻohui pinepine ʻia ke kumu dopant me ke kinoea lawe (e like me ka argon a me ka nitrogen) i loko o kahi keʻena kumu. Hoʻokomo mau ʻia ke kinoea hui ʻia i loko o kahi umu hoʻohalahala a kaʻapuni a puni ka wafer, e waiho ana i ka dopant ma ka ʻili wafer. Hoʻopili ka dopant me ke kilika e hana i ka metala dopant e neʻe ana i loko o ke kilika.

Hui kinoea ulu epitaxial

ʻO ka ulu ʻana epitaxial ke kaʻina o ka waiho ʻana a me ka ulu ʻana i kahi mea aniani hoʻokahi ma luna o kahi ʻili substrate. I loko o ka ʻoihana semiconductor, ʻo nā kinoea i hoʻohana ʻia e ulu i hoʻokahi a ʻoi aʻe paha o nā ʻāpana o nā mea me ka hoʻohana ʻana i ka wai mahu (CVD) ma kahi substrate i koho ʻia i kapa ʻia he epitaxial gases. ʻO nā kinoea epitaxial silika maʻamau ka dihydrogen dichlorosilane, silicon tetrachloride, a me ka silane. Hoʻohana mua ʻia lākou no ka hoʻoheheʻe ʻana o ke silika epitaxial, ka deposition silikon polycrystalline, ka waiho ʻana o ke kiʻiʻoniʻoni silicon oxide, ka hoʻoheheʻe kiʻiʻoniʻoni silicon nitride, a me ka hoʻopaʻa kiʻi ʻoniʻoni amorphous no nā cell solar a me nā mea photosensitive ʻē aʻe.

Ion implantation kinoea

I ka mīkini semiconductor a me ka hana kaapuni i hoʻohui ʻia, ua kapa ʻia nā kinoea i hoʻohana ʻia i ke kaʻina hana implantation ion i nā kinoea implantation. ʻO nā mea haumia ionized (e like me ka boron, phosphorus, a me nā arsenic ion) e hoʻolalelale ʻia i kahi pae ikehu kiʻekiʻe ma mua o ka hoʻokomo ʻia ʻana i loko o ka substrate. Hoʻohana nui ʻia ka ʻenehana implantation ion e kāohi i ka volta paepae. Hiki ke hoʻoholo ʻia ka nui o nā mea haumia i hoʻokomo ʻia ma ke ana ʻana i ke ʻano o ka ion beam. Hoʻokomo pinepine ʻia nā kinoea implantation ion i nā phosphorus, arsenic, a me nā kinoea boron.

ʻO ke kinoea huikau

ʻO ka etching ke kaʻina hana o ka ʻili ʻana i ka ʻili i hana ʻia (e like me ke kiʻi metala, silicon oxide film, etc.) ma ka substrate ʻaʻole i uhi ʻia e ka photoresist, ʻoiai e mālama ana i ka wahi i uhi ʻia e ka photoresist, i loaʻa ai ke ʻano kiʻi i makemake ʻia ma ka ʻili substrate.

Huihuʻi kinoea hoʻopaʻa ʻana i ka mahu kemika

Hoʻohana ka hoʻoheheʻe ʻana i ka mahu (CVD) i nā mea hoʻoheheʻe e waiho ai i hoʻokahi mea a i ʻole pūhui ma o ka hopena kemika vapor-phase. He ʻano hana kiʻiʻoniʻoni kēia e hoʻohana ana i nā hopena kemika vapor-phase. ʻOkoʻa nā kinoea CVD i hoʻohana ʻia ma muli o ke ʻano o ke kiʻiʻoniʻoni i hana ʻia.