Epitaxial (ulu)Huipuia Gas

I loko o ka ʻoihana semiconductor, ʻo ke kinoea i hoʻohana ʻia e ulu i hoʻokahi a ʻoi aʻe paha o nā ʻāpana o ka mea ma o ka waiho ʻana o ka mahu ma luna o kahi substrate i koho pono ʻia i kapa ʻia ke kinoea epitaxial.

ʻO nā kinoea epitaxial silika maʻamau ka dichlorosilane, silicon tetrachloride a mesilane. Hoʻohana nui ʻia no ka epitaxial silicon deposition, silicon oxide film deposition, silicon nitride film deposition, amorphous silicon film deposition no nā cell solar a me nā photoreceptors ʻē aʻe, a me nā mea ʻē aʻe.

ʻO ke kinoea hui pū ʻia (CVD).

ʻO CVD kahi ʻano o ka waiho ʻana i kekahi mau mea a me nā mea hoʻohui e ka hoʻohana ʻana i nā mea hoʻoheheʻe kinoea me ka hoʻohana ʻana i nā pūhui volatile, ʻo ia hoʻi, ke ʻano hana kiʻiʻoniʻoni me ka hoʻohana ʻana i nā hopena kemika. Ma muli o ke ʻano o ke kiʻiʻoniʻoni i hana ʻia, ʻokoʻa hoʻi ke kinoea chemical deposition (CVD) i hoʻohana ʻia.

Dopingkinoea huikau

I ka hana ʻana i nā mea hana semiconductor a me nā kaʻa i hoʻohui ʻia, ua doped kekahi mau mea haumia i nā mea semiconductor e hāʻawi i nā mea i ke ʻano conductivity pono a me kekahi resistivity i ka hana ʻana i nā resistors, PN junctions, kanu ʻia nā papa, etc.

ʻO ka mea nui ka arsenic, phosphine, phosphorus trifluoride, phosphorus pentafluoride, arsenic trifluoride, arsenic pentafluoride,boron trifluoride, diborane, etc.

ʻO ka maʻamau, hui ʻia ke kumu doping me ke kinoea lawe (e like me argon a me ka nitrogen) i loko o kahi keʻena kumu. Ma hope o ka hui ʻana, hoʻokomo mau ʻia ke kahe o ke kinoea i loko o ka umu diffusion a hoʻopuni i ka wafer, e waiho ana i nā dopants ma ka ʻili o ka wafer, a laila e hana me ke silika e hoʻohua i nā metala doped e neʻe i loko o ke silika.

Kaʻi ʻanaHuihui kinoea

ʻO ka etching ke kāʻili ʻana i ka ʻili o ka hana (e like me ke kiʻiʻoniʻoni metala, silicon oxide film, a me nā mea ʻē aʻe) ma luna o ka substrate me ka ʻole o ka masking photoresist, ʻoiai e mālama ana i ka wahi me ka masking photoresist, i loaʻa ai ke ʻano kiʻi i makemake ʻia ma ka ʻili o ka substrate.

ʻO nā ʻano etching e pili ana i ka etching kemika pulu a me ka etching kemika maloʻo. Ua kapa ʻia ke kinoea i hoʻohana ʻia i ka etching kemika maloʻo.

ʻO ke kinoea etching ke kinoea fluoride (halide), e like mekalapona tetrafluoride, nitrogen trifluoride, trifluoromethane, hexafluoroethane, perfluoropropane, etc.