Ke kūʻai wela ʻia nei ʻo Kina High Purity Carbon Tetrafluoride CF4 Gas no ka Semiconductor Industry Etching

Hoʻokō mau mākou i ko mākou ʻuhane o "ka hana hou e lawe mai ana i ka holomua, ke kūlana kiʻekiʻe e hana ana i kahi ola, ka pono kūʻai aku ʻana o ka hoʻokele, ka helu hōʻaiʻē e huki ana i nā mea kūʻai aku no ke kūʻai aku ʻana i ka China High Purity Carbon Tetrafluoride CF4 Gas no ka Semiconductor Industry Etching, hoʻokipa maikaʻi mākou i nā hoaaloha mai nā ʻano like ʻole o ke ola o kēlā me kēia lā e ʻimi i ka laulima like a kūkulu i kahi lā ʻapōpō ʻoi aku ka ʻālohilohi a me ka nani.
Hoʻokō mau mākou i ko mākou ʻuhane o "ka hana hou e lawe mai ana i ka holomua, ke kūlana kiʻekiʻe e hana ana i kekahi ola, ka pono kūʻai aku ʻana o ka hoʻokele, ka helu hōʻaiʻē e hoʻowalewale ana i nā mea kūʻai aku noKinoea Refrigerant CF4 Kina, Paukū Kinoea, ʻO mākou kou hoa hilinaʻi ma nā mākeke honua me nā waiwai maikaʻi loa. ʻO kā mākou mau pono ka hana hou, ka maʻalahi a me ka hilinaʻi i kūkulu ʻia i nā makahiki he iwakālua i hala. Ke nānā nei mākou i ka hāʻawi ʻana i ka lawelawe no kā mākou mea kūʻai aku ma ke ʻano he mea nui i ka hoʻoikaika ʻana i kā mākou pilina lōʻihi. ʻO kā mākou loaʻa mau ʻana o nā hoʻonā kiʻekiʻe me kā mākou lawelawe mua a me ke kūʻai aku ma hope e hōʻoiaʻiʻo ana i ka hoʻokūkū ikaika ma kahi mākeke honua e ulu nei.

Nā Palena ʻenehana

ʻO ke kalapona tetrafluoride kahi hydrocarbon halogenated me ke ʻano kemika CF4. Hiki ke manaʻo ʻia he hydrocarbon halogenated, methane halogenated, perfluorocarbon, a i ʻole he hui inorganic. ʻO ke kalapona tetrafluoride kahi kinoea ʻaʻohe kala a ʻala ʻole, hoʻoheheʻe ʻole ʻia i ka wai, hoʻoheheʻe ʻia i ka benzene a me ka chloroform. Paʻa ma lalo o ka mahana maʻamau a me ke kaomi, pale i nā oxidants ikaika, nā mea lapalapa a i ʻole nā ​​mea hiki ke puhi. ʻO ke kinoea ʻaʻole hiki ke puhi, e hoʻonui ʻia ke kaomi o loko o ka pahu ke hōʻike ʻia i ka wela kiʻekiʻe, a aia kahi pilikia o ka haki a me ka pahū. He paʻa kemika a ʻaʻole hiki ke lapalapa. ʻO ka mea hana metala ammonia-sodium wai wale nō ke hana ma ka mahana o ka lumi. ʻO ke kalapona tetrafluoride kahi kinoea e hoʻoulu ai i ka hopena ʻōmaʻomaʻo. He paʻa loa ia, hiki ke noho i ka lewa no ka manawa lōʻihi, a he kinoea ʻōmaʻomaʻo ikaika loa. Hoʻohana ʻia ke kalapona tetrafluoride i ke kaʻina hana etching plasma o nā kaapuni hoʻohui like ʻole. Hoʻohana ʻia hoʻi ia ma ke ʻano he kinoea laser, a hoʻohana ʻia i loko o nā refrigerants haʻahaʻa haʻahaʻa, nā solvents, nā lubricants, nā mea hoʻokaʻawale, a me nā coolants no nā mea ʻike infrared. ʻO ia ka kinoea etching plasma i hoʻohana nui ʻia ma ka ʻoihana microelectronics. He hui ia o ke kinoea tetrafluoromethane kiʻekiʻe-purity a me ke kinoea tetrafluoromethane kiʻekiʻe-purity a me ka oxygen kiʻekiʻe-purity. Hiki ke hoʻohana nui ʻia i loko o ka silicon, silicon dioxide, silicon nitride, a me ke aniani phosphosilicate. Hoʻohana nui ʻia ka etching o nā mea ʻili lahilahi e like me ka tungsten a me ka tungsten i ka hoʻomaʻemaʻe ʻili o nā mea uila, ka hana ʻana o nā cell solar, ka ʻenehana laser, ka refrigeration haʻahaʻa haʻahaʻa, ka nānā ʻana i ka leak, a me ka detergent i ka hana ʻana o nā kaapuni paʻi. Hoʻohana ʻia ma ke ʻano he refrigerant haʻahaʻa haʻahaʻa a me ka ʻenehana etching maloʻo plasma no nā kaapuni i hoʻohui ʻia. Nā palekana no ka mālama ʻana: E mālama i loko o kahi hale kūʻai kinoea anuanu, ventilated, ʻaʻole hiki ke puhi. E mālama mai ke ahi a me nā kumu wela. ʻAʻole pono e ʻoi aku ka mahana o ka mālama ʻana ma mua o 30°C. Pono e mālama ʻokoʻa ʻia mai nā mea ʻā maʻalahi (hiki ke puhi) a me nā mea hoʻoheheʻe ʻia, a pale i ka mālama ʻana i nā mea like ʻole. Pono e hoʻolako ʻia kahi mālama me nā lako hana lapaʻau ulia pōpilikia liki.

Noi:

① Mea hoʻomaʻalili:

I kekahi manawa hoʻohana ʻia ʻo Tetrafluoromethane ma ke ʻano he refrigerant haʻahaʻa haʻahaʻa.

② Ke kālai ʻana:

Hoʻohana ʻia ia i ka hana microhana uila wale nō a i ʻole i ka hui pū ʻana me ka oxygen ma ke ʻano he plasma etchant no ka silicon, silicon dioxide, a me ka silicon nitride.

Pūʻolo maʻamau:

Pōmaikaʻi:

①High maemae, hale hou loa;

②Mea hana palapala hōʻoia ISO;

③Hoʻouna wikiwiki;

ʻŌnaehana loiloi pūnaewele no ka kaohi maikaʻi i kēlā me kēia ʻanuʻu;

⑤Kūpono kiʻekiʻe a me ke kaʻina hana meticulous no ka lawelawe ʻana i ka cylinder ma mua o ka hoʻopiha ʻana;Hoʻokō mau mākou i ko mākou ʻuhane o "ka hana hou e lawe mai ana i ka holomua, ke kūlana kiʻekiʻe e hana ana i kahi ola, ka pono kūʻai aku ʻana o ka hoʻokele, ka helu hōʻaiʻē e huki ana i nā mea kūʻai aku no ke kūʻai aku ʻana i ka China High Purity Carbon Tetrafluoride CF4 Gas no ka Semiconductor Industry Etching, hoʻokipa maikaʻi mākou i nā hoaaloha mai nā ʻano like ʻole o ke ola o kēlā me kēia lā e ʻimi i ka laulima like a kūkulu i kahi lā ʻapōpō ʻoi aku ka ʻālohilohi a me ka nani.
Kūʻai welaKinoea Refrigerant CF4 Kina, Paukū Kinoea, ʻO mākou kou hoa hilinaʻi ma nā mākeke honua me nā waiwai maikaʻi loa. ʻO kā mākou mau pono ka hana hou, ka maʻalahi a me ka hilinaʻi i kūkulu ʻia i nā makahiki he iwakālua i hala. Ke nānā nei mākou i ka hāʻawi ʻana i ka lawelawe no kā mākou mea kūʻai aku ma ke ʻano he mea nui i ka hoʻoikaika ʻana i kā mākou pilina lōʻihi. ʻO kā mākou loaʻa mau ʻana o nā hoʻonā kiʻekiʻe me kā mākou lawelawe mua a me ke kūʻai aku ma hope e hōʻoiaʻiʻo ana i ka hoʻokūkū ikaika ma kahi mākeke honua e ulu nei.