Hana mau mākou i kā mākou ʻuhane o "Innovation e lawe mai ana i ka holomua, Highly-quality making some subsistence, Administration marketing benefit, Credit score attracting customers for Hot-selling China High Purity Carbon Tetrafluoride CF4 Gas for Semiconductor Industry Etching, Hoʻokipa maikaʻi mākou i nā hoaaloha mai nā wahi a pau o ka nohona o kēlā me kēia lā e ʻimi i ka hui like ʻana a kūkulu i ka lā ʻapōpō nani a nani hoʻi.
Hoʻokō mau mākou i kā mākou ʻuhane o ka "Innovation e lawe mai ana i ka holomua, Highly-quality making some subsistence, Administration marketing benefit, Credit score attracting customers forKina CF4 kinoea hoohuoi, Puʻu kinoea, ʻO mākou kāu hoa hilinaʻi ma nā mākeke honua me nā waiwai maikaʻi loa. ʻO kā mākou mea maikaʻi he mea hou, hiki ke maʻalahi a me ka hilinaʻi i kūkulu ʻia i nā makahiki he iwakālua i hala. Kūleʻa mākou i ka hāʻawi ʻana i ka lawelawe no kā mākou mea kūʻai aku ma ke ʻano he kumu nui i ka hoʻoikaika ʻana i kā mākou pilina lōʻihi. ʻO kā mākou loaʻa mau ʻana o nā haʻina hana kiʻekiʻe i hui pū ʻia me kā mākou lawelawe mua-kūʻai maikaʻi loa a ma hope o ke kūʻai aku e hōʻoia i ka hoʻokūkū ikaika i kahi mākeke ulu honua.
| Hōʻike | 99.999% |
| Oxygen+Argon | ≤1ppm |
| Nitrogen | ≤4 ppm |
| Māmā (H2O) | ≤3 ppm |
| HF | ≤0.1 ppm |
| CO | ≤0.1 ppm |
| CO2 | ≤1 ppm |
| SF6 | ≤1 ppm |
| Halocarbynes | ≤1 ppm |
| Huina paumaele | ≤10 ppm |
ʻO ka carbon tetrafluoride kahi hydrocarbon halogenated me ke ʻano kemika CF4. Hiki ke noʻonoʻo ʻia he hydrocarbon halogenated, methane halogenated, perfluorocarbon, a i ʻole he pūhui inorganic. ʻO ka carbon tetrafluoride he kinoea kala ʻole a ʻala ʻole, hiki ʻole ke hoʻoheheʻe ʻia i ka wai, hiki ke hoʻoheheʻe ʻia i ka benzene a me ka chloroform. Paʻa ma lalo o ka mahana maʻamau a me ke kaomi, e pale i nā mea hoʻoheheʻe ikaika, nā mea hiki ke puhi a puhi paha. ʻO ke kinoea non-combustible, e piʻi aʻe ke kaomi o loko o ka ipu i ka wā e ʻike ʻia ai i ka wela kiʻekiʻe, a aia ka pilikia o ka pohā a me ka pahū. He paʻa kemika a hiki ʻole ke puhi ʻia. Hiki ke hana ma ka wela o ka lumi. ʻO ka carbon tetrafluoride kahi kinoea e hoʻoulu ai i ka hopena ʻōmaʻomaʻo. Paʻa loa ia, hiki ke noho i ka lewa no ka manawa lōʻihi, a he kinoea hoʻomehana honua ikaika loa. Hoʻohana ʻia ka carbon tetrafluoride i ke kaʻina hana etching plasma o nā ʻāpana like ʻole. Hoʻohana ʻia ia e like me ke kinoea laser, a hoʻohana ʻia i nā refrigerants haʻahaʻa haʻahaʻa, solvents, lubricants, insulating material, a me nā mea hoʻonaninani no nā mea ʻike infrared. ʻO ia ke kinoea etching plasma i hoʻohana nui ʻia i ka ʻoihana microelectronics. He hui ia o ke kinoea hoʻomaʻemaʻe kiʻekiʻe tetrafluoromethane a me ke kinoea hoʻomaʻemaʻe kiʻekiʻe tetrafluoromethane a me ka oxygen maʻemaʻe kiʻekiʻe. Hiki ke hoʻohana nui ʻia i loko o ke silika, silika dioxide, silicon nitride, a me ke aniani phosphosilicate. Hoʻohana nui ʻia ka etching o nā mea ʻoniʻoni ʻoniʻoni e like me ka tungsten a me ka tungsten i ka hoʻomaʻemaʻe ʻana i ka ʻili o nā mea uila, ka hana ʻana o ka solar cell, ka ʻenehana laser, ka haʻahaʻa haʻahaʻa haʻahaʻa, ka nānā ʻana i ka leak, a me ka detergent i ka hana kaapuni paʻi. Hoʻohana ʻia ma ke ʻano he mea hoʻoheheʻe haʻahaʻa haʻahaʻa a me ka ʻenehana etching maloʻo plasma no nā kaapuni hoʻohui. E mālama i ka mālama ʻana: E kūʻai i loko o kahi hale kūʻai kinoea ʻaʻole hiki ke puhi ʻia. E mālama i ke ahi a me nā kumu wela. ʻAʻole pono ka mahana o ka mālama ʻana ma mua o 30 ° C. Pono e mālama ʻokoʻa ʻia mai nā mea puhi maʻalahi a me nā mea oxidants, a pale i ka waiho ʻana. Pono e hoʻolako ʻia ka wahi e mālama ai me nā lako lapaʻau ulia pōpilikia.
① Mea hoʻoheheʻe:
Hoʻohana ʻia ʻo Tetrafluoromethane i kekahi manawa ma ke ʻano he mea hoʻomehana wela haʻahaʻa.
② Hoʻopili:
Hoʻohana ʻia ia i ka microfabrication uila wale nō a i hui pū ʻia me ka oxygen ma ke ʻano he etchant plasma no ke silika, silicon dioxide, a me ka silicon nitride.
| Huahana | Carbon Tetrafluoride CF4 | ||
| Nui pūʻolo | 40Ltr Cylinder | 50Ltr Cylinder | |
| Hoʻopiha i ke kaumaha Upena/Cyl | 30Kgs | 38Kgs | |
| QTY Hoʻouka ʻia ma 20'Container | 250 Kiekie | 250 Kiekie | |
| Huina Uila Kaumaha | 7.5 Tona | 9.5 Tona | |
| Paona Tare Cylinder | 50Kgs | 55Kgs | |
| Valve | CGA 580 | ||
①Maʻemaʻe kiʻekiʻe, hale hana hou loa;
②Ka mea hana palapala ISO;
③Hoʻouna wikiwiki;
④ Pūnaehana loiloi pūnaewele no ka mālama maikaʻi ʻana i kēlā me kēia pae;
⑤Ke koi kiʻekiʻe a me ke kaʻina hana no ka mālama ʻana i ka cylinder ma mua o ka hoʻopiha ʻana;Hana mau mākou i kā mākou ʻuhane o "Innovation e lawe mai ana i ka holomua, Highly-quality making some subsistence, Administration marketing benefit, Credit score attracting customers for Hot-selling China High Purity Carbon Tetrafluoride CF4 Gas for Semiconductor Industry Etching, Hoʻokipa maikaʻi mākou i nā hoaaloha mai nā wahi a pau o ka nohona o kēlā me kēia lā e ʻimi i ka hui like ʻana a kūkulu i ka lā ʻapōpō nani a nani hoʻi.
Kūʻai welaKina CF4 kinoea hoohuoi, Puʻu kinoea, ʻO mākou kāu hoa hilinaʻi ma nā mākeke honua me nā waiwai maikaʻi loa. ʻO kā mākou mea maikaʻi he mea hou, hiki ke maʻalahi a me ka hilinaʻi i kūkulu ʻia i nā makahiki he iwakālua i hala. Kūleʻa mākou i ka hāʻawi ʻana i ka lawelawe no kā mākou mea kūʻai aku ma ke ʻano he kumu nui i ka hoʻoikaika ʻana i kā mākou pilina lōʻihi. ʻO kā mākou loaʻa mau ʻana o nā haʻina hana kiʻekiʻe i hui pū ʻia me kā mākou lawelawe mua-kūʻai maikaʻi loa a ma hope o ke kūʻai aku e hōʻoia i ka hoʻokūkū ikaika i kahi mākeke ulu honua.