Kūʻai wela no Carbon Tetrafluoride / Tetrafluoromethane CF4 Gas 99.999% Purity Electronic Grade no Semiconductor

ʻO ka wehewehe pōkole:


Huahana Huahana

Huahana Huahana

Me nā ʻenehana a me nā lako, nā kauoha koʻikoʻi koʻikoʻi, nā kumukūʻai kūpono, ka mea hoʻolako kūikawā a me ka hui pū ʻana me nā mea kūʻai aku, ua hoʻolaʻa mākou i ka hāʻawi ʻana i ka pōmaikaʻi maikaʻi loa no kā mākou mea kūʻai aku no ke kūʻai ʻana no ka Carbon Tetrafluoride / Tetrafluoromethane CF4 Gas 99.999% Purity Electronic Papa no Semiconductor, ʻO ka pahuhopu nui o kā mākou hui e ola i kahi hoʻomanaʻo maikaʻi i nā mea kūʻai a pau, a hoʻokumu i kahi hui aloha lōʻihi. pilina me nā mea kūʻai aku a me nā mea hoʻohana a puni ka honua.
Me nā ʻenehana maikaʻi a me nā lako, nā kauoha koʻikoʻi koʻikoʻi, nā kumukūʻai kūpono, ka mea hoʻolako kūikawā a me ka launa pū ʻana me nā mea kūʻai aku, ua hoʻolaʻa mākou i ka hāʻawi ʻana i ka pōmaikaʻi maikaʻi loa no kā mākou mea kūʻaiKina CF4 a me CF4 Gas, Ke nānā nei mākou i ka hāʻawiʻana i ka lawelawe no kā mākou mau mea kūʻai ma keʻano he mea nui i ka hoʻoikaikaʻana i kā mākou mau pilina lōʻihi. ʻO kā mākou loaʻa mau ʻana o nā waiwai kiʻekiʻe i hui pū ʻia me kā mākou lawelawe mua-kūʻai maikaʻi loa a ma hope o ke kūʻai aku e hōʻoia i ka hoʻokūkū ikaika i kahi mākeke ulu honua. Makemake mākou e hui pū me nā hoaaloha ʻoihana mai ka home a i waho a hana pū i kahi wā e hiki mai ana.

Nā ʻāpana ʻenehana

Hōʻike 99.999%
Oxygen+Argon ≤1ppm
Nitrogen ≤4 ppm
Māmā (H2O) ≤3 ppm
HF ≤0.1 ppm
CO ≤0.1 ppm
CO2 ≤1 ppm
SF6 ≤1 ppm
Halocarbynes ≤1 ppm
Huina paumaele ≤10 ppm

ʻO ka carbon tetrafluoride kahi hydrocarbon halogenated me ke ʻano kemika CF4. Hiki ke noʻonoʻo ʻia he hydrocarbon halogenated, methane halogenated, perfluorocarbon, a i ʻole he pūhui inorganic. ʻO ka carbon tetrafluoride he kinoea kala ʻole a ʻala ʻole, hiki ʻole ke hoʻoheheʻe ʻia i ka wai, hiki ke hoʻoheheʻe ʻia i ka benzene a me ka chloroform. Paʻa ma lalo o ka mahana maʻamau a me ke kaomi, e pale i nā mea hoʻoheheʻe ikaika, nā mea hiki ke puhi a puhi paha. ʻO ke kinoea non-combustible, e piʻi aʻe ke kaomi o loko o ka ipu i ka wā e ʻike ʻia ai i ka wela kiʻekiʻe, a aia ka pilikia o ka pohā a me ka pahū. He paʻa kemika a hiki ʻole ke puhi ʻia. Hiki ke hana ma ka wela o ka lumi. ʻO ka carbon tetrafluoride kahi kinoea e hoʻoulu ai i ka hopena ʻōmaʻomaʻo. He paʻa loa, hiki ke noho i ka lewa no ka manawa lōʻihi, a he kinoea hoʻomehana honua ikaika loa. Hoʻohana ʻia ka carbon tetrafluoride i ke kaʻina hana etching plasma o nā kaʻina hoʻohui like ʻole. Hoʻohana ʻia ia e like me ke kinoea laser, a hoʻohana ʻia i nā refrigerants haʻahaʻa haʻahaʻa, solvents, lubricants, insulating material, a me nā mea hoʻonaninani no nā mea ʻike infrared. ʻO ia ke kinoea etching plasma i hoʻohana nui ʻia i ka ʻoihana microelectronics. He hui ia o ke kinoea hoʻomaʻemaʻe kiʻekiʻe tetrafluoromethane a me ke kinoea hoʻomaʻemaʻe kiʻekiʻe tetrafluoromethane a me ka oxygen maʻemaʻe kiʻekiʻe. Hiki ke hoʻohana nui ʻia i loko o ke silika, silicon dioxide, silicon nitride, a me ke aniani phosphosilicate. Hoʻohana nui ʻia ka etching o nā mea kiʻi ʻoniʻoni ʻoniʻoni e like me tungsten a me tungsten i ka hoʻomaʻemaʻe ʻana i ka ʻili o nā mea uila, ka hana ʻana o ka lā, ka ʻenehana laser, ka haʻahaʻa haʻahaʻa haʻahaʻa, ka nānā ʻana i ka leak, a me ka detergent i ka hana kaapuni paʻi. Hoʻohana ʻia ma ke ʻano he mea hoʻoheheʻe haʻahaʻa haʻahaʻa a me ka ʻenehana etching maloʻo plasma no nā kaapuni hoʻohui. E mālama i ka mālama ʻana: E kūʻai i loko o kahi hale kūʻai kinoea ʻaʻole hiki ke puhi ʻia. E mālama i ke ahi a me nā kumu wela. ʻAʻole pono ka mahana o ka mālama ʻana ma mua o 30 ° C. Pono e mālama ʻokoʻa ʻia mai nā mea puhi maʻalahi a me nā mea oxidants, a pale i ka waiho ʻana. Pono e hoʻolako ʻia ka wahi e mālama ai me nā lako lapaʻau ulia pōpilikia.

Noi:

① Mea hoʻoheheʻe:

Hoʻohana ʻia ʻo Tetrafluoromethane i kekahi manawa ma ke ʻano he mea hoʻomehana wela haʻahaʻa.

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② Hoʻopili:

Hoʻohana ʻia ia i ka microfabrication uila wale nō a i hui pū ʻia me ka oxygen ma ke ʻano he etchant plasma no ke silika, silicon dioxide, a me ka silicon nitride.

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Pūʻolo maʻamau:

Huahana Carbon Tetrafluoride CF4
Nui pūʻolo 40Ltr Cylinder 50Ltr Cylinder  
Hoʻopiha ʻana i ke kaupaona ʻupena/Cyl 30Kgs 38Kgs  
QTY Hoʻouka ʻia ma 20'Container 250 Kiekie 250 Kiekie
Huina Uila Kaumaha 7.5 Tona 9.5 Tona
Paona Tare Cylinder 50Kgs 55Kgs
Valve CGA 580

Pōmaikaʻi:

①Maʻemaʻe kiʻekiʻe, hale hana hou loa;

②Ka mea hana palapala ISO;

③Hoʻouna wikiwiki;

④ Pūnaehana loiloi pūnaewele no ka mālama maikaʻi ʻana i kēlā me kēia pae;

⑤Ke koi kiʻekiʻe a me ke kaʻina hana no ka mālama ʻana i ka cylinder ma mua o ka hoʻopiha ʻana;Me nā ʻenehana a me nā lako, nā kauoha koʻikoʻi koʻikoʻi, nā kumukūʻai kūpono, ka mea hoʻolako kūikawā a me ka hui pū ʻana me nā mea kūʻai aku, ua hoʻolaʻa mākou i ka hāʻawi ʻana i ka pōmaikaʻi maikaʻi loa no kā mākou mea kūʻai aku no ke kūʻai ʻana no ka Carbon Tetrafluoride / Tetrafluoromethane CF4 Gas 99.999% Purity Electronic Papa no Semiconductor, ʻO ka pahuhopu nui o kā mākou hui e ola i kahi hoʻomanaʻo maikaʻi i nā mea kūʻai a pau, a hoʻokumu i kahi hui aloha lōʻihi. pilina me nā mea kūʻai aku a me nā mea hoʻohana a puni ka honua.
Kuai Wela noKina CF4 a me CF4 Gas, Ke nānā nei mākou i ka hāʻawiʻana i ka lawelawe no kā mākou mau mea kūʻai ma keʻano he mea nui i ka hoʻoikaikaʻana i kā mākou mau pilina lōʻihi. ʻO kā mākou loaʻa mau ʻana o nā waiwai kiʻekiʻe i hui pū ʻia me kā mākou lawelawe mua-kūʻai maikaʻi loa a ma hope o ke kūʻai aku e hōʻoia i ka hoʻokūkū ikaika i kahi mākeke ulu honua. Makemake mākou e hui pū me nā hoaaloha ʻoihana mai ka home a i waho a hana pū i kahi wā e hiki mai ana.


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