Me nā ʻenehana a me nā pono hana kiʻekiʻe, ke kauoha maikaʻi loa, ke kumukūʻai kūpono, ka mea hoʻolako kūikawā a me ka laulima pili me nā mea kūʻai aku, ua hoʻolaʻa ʻia mākou i ka hāʻawi ʻana i ka pono maikaʻi loa no kā mākou mea kūʻai aku no ke kūʻai wela no Carbon Tetrafluoride / Tetrafluoromethane CF4 Gas 99.999% Purity Electronic Grade no Semiconductor, ʻO ka pahuhopu nui o kā mākou hui, ʻo ia ke ola i kahi hoʻomanaʻo maikaʻi i nā mea kūʻai aku a pau, a hoʻokumu i kahi pilina aloha lōʻihi me nā mea kūʻai aku a me nā mea hoʻohana a puni ka honua.
Me nā ʻenehana a me nā pono hana kiʻekiʻe, ke kauoha kūlana koʻikoʻi, ke kumukūʻai kūpono, ka mea hoʻolako kūikawā a me ka laulima pū ʻana me nā mea kūʻai aku, ua hoʻolaʻa ʻia mākou i ka hāʻawi ʻana i ka pono maikaʻi loa no kā mākou mea kūʻai aku.Kina CF4 a me ke Kinoea CF4, Ke kālele nei mākou i ka hāʻawi ʻana i ka lawelawe no kā mākou mea kūʻai aku ma ke ʻano he mea nui i ka hoʻoikaika ʻana i kā mākou pilina lōʻihi. ʻO kā mākou loaʻa mau ʻana o nā waiwai kiʻekiʻe me kā mākou lawelawe mua-kūʻai a ma hope o ke kūʻai aku e hōʻoiaʻiʻo ana i ka hoʻokūkū ikaika i kahi mākeke honua e ulu nei. Makemake mākou e hana pū me nā hoaaloha ʻoihana mai ka home a ma waho a hana i kahi wā e hiki mai ana maikaʻi.
| Nā kikoʻī | 99.999% |
| ʻOkikene+ʻArgon | ≤1ppm |
| Naikokene | ≤4 ppm |
| Ka makū (H2O) | ≤3 ppm |
| HF | ≤0.1 ppm |
| CO | ≤0.1 ppm |
| CO2 | ≤1 ppm |
| SF6 | ≤1 ppm |
| Nā Halocarbynes | ≤1 ppm |
| Nā mea haumia āpau | ≤10 ppm |
ʻO ke kalapona tetrafluoride kahi hydrocarbon halogenated me ke ʻano kemika CF4. Hiki ke manaʻo ʻia he hydrocarbon halogenated, methane halogenated, perfluorocarbon, a i ʻole he hui inorganic. ʻO ke kalapona tetrafluoride kahi kinoea ʻaʻohe kala a ʻala ʻole, hoʻoheheʻe ʻole ʻia i ka wai, hoʻoheheʻe ʻia i ka benzene a me ka chloroform. Paʻa ma lalo o ka mahana maʻamau a me ke kaomi, pale i nā oxidants ikaika, nā mea lapalapa a i ʻole nā mea hiki ke puhi. ʻO ke kinoea ʻaʻole hiki ke puhi, e hoʻonui ʻia ke kaomi o loko o ka pahu ke hōʻike ʻia i ka wela kiʻekiʻe, a aia kahi pilikia o ka haki a me ka pahū. He paʻa kemika a ʻaʻole hiki ke lapalapa. ʻO ka mea hana metala ammonia-sodium wai wale nō ke hana ma ka mahana o ka lumi. ʻO ke kalapona tetrafluoride kahi kinoea e hoʻoulu ai i ka hopena ʻōmaʻomaʻo. He paʻa loa ia, hiki ke noho i ka lewa no ka manawa lōʻihi, a he kinoea ʻōmaʻomaʻo ikaika loa. Hoʻohana ʻia ke kalapona tetrafluoride i ke kaʻina hana etching plasma o nā kaapuni hoʻohui like ʻole. Hoʻohana ʻia hoʻi ia ma ke ʻano he kinoea laser, a hoʻohana ʻia i loko o nā refrigerants haʻahaʻa haʻahaʻa, nā solvents, nā lubricants, nā mea hoʻokaʻawale, a me nā coolants no nā mea ʻike infrared. ʻO ia ka kinoea etching plasma i hoʻohana nui ʻia ma ka ʻoihana microelectronics. He hui ia o ke kinoea tetrafluoromethane kiʻekiʻe-purity a me ke kinoea tetrafluoromethane kiʻekiʻe-purity a me ka oxygen kiʻekiʻe-purity. Hiki ke hoʻohana nui ʻia i loko o ka silicon, silicon dioxide, silicon nitride, a me ke aniani phosphosilicate. Hoʻohana nui ʻia ka etching o nā mea ʻili lahilahi e like me ka tungsten a me ka tungsten i ka hoʻomaʻemaʻe ʻili o nā mea uila, ka hana ʻana o nā cell solar, ka ʻenehana laser, ka refrigeration haʻahaʻa haʻahaʻa, ka nānā ʻana i ka leak, a me ka detergent i ka hana ʻana o nā kaapuni paʻi. Hoʻohana ʻia ma ke ʻano he refrigerant haʻahaʻa haʻahaʻa a me ka ʻenehana etching maloʻo plasma no nā kaapuni i hoʻohui ʻia. Nā palekana no ka mālama ʻana: E mālama i loko o kahi hale kūʻai kinoea anuanu, ventilated, ʻaʻole hiki ke puhi. E mālama mai ke ahi a me nā kumu wela. ʻAʻole pono e ʻoi aku ka mahana o ka mālama ʻana ma mua o 30°C. Pono e mālama ʻokoʻa ʻia mai nā mea ʻā maʻalahi (hiki ke puhi) a me nā mea hoʻoheheʻe ʻia, a pale i ka mālama ʻana i nā mea like ʻole. Pono e hoʻolako ʻia kahi mālama me nā lako hana lapaʻau ulia pōpilikia liki.
① Mea hoʻomaʻalili:
I kekahi manawa hoʻohana ʻia ʻo Tetrafluoromethane ma ke ʻano he refrigerant haʻahaʻa haʻahaʻa.
② Ke kālai ʻana:
Hoʻohana ʻia ia i ka hana microhana uila wale nō a i ʻole i ka hui pū ʻana me ka oxygen ma ke ʻano he plasma etchant no ka silicon, silicon dioxide, a me ka silicon nitride.
| Huahana | Kāpona Tetrafluoride CF4 | ||
| Ka nui o ka pūʻolo | Paukū 40Ltr | Paukū 50Ltr | |
| Hoʻopiha i ke kaumaha ʻupena/Cyl | 30Kgs | 38Kgs | |
| Ka nui i hoʻouka ʻia i loko o ka ipu 20' | 250 Cyls | 250 Cyls | |
| Kaumaha ʻupena holoʻokoʻa | 7.5 Tons | 9.5 Tons | |
| Kaumaha Tare o ka paukūʻolokaʻa | 50Kgs | 55Kgs | |
| Kiwikā | CGA 580 | ||
①High maemae, hale hou loa;
②Mea hana palapala hōʻoia ISO;
③Hoʻouna wikiwiki;
ʻŌnaehana loiloi pūnaewele no ka kaohi maikaʻi i kēlā me kēia ʻanuʻu;
⑤Kūpono kiʻekiʻe a me ke kaʻina hana meticulous no ka lawelawe ʻana i ka cylinder ma mua o ka hoʻopiha ʻana;Me nā ʻenehana a me nā pono hana kiʻekiʻe, ke kauoha maikaʻi loa, ke kumukūʻai kūpono, ka mea hoʻolako kūikawā a me ka laulima pili me nā mea kūʻai aku, ua hoʻolaʻa ʻia mākou i ka hāʻawi ʻana i ka pono maikaʻi loa no kā mākou mea kūʻai aku no ke kūʻai wela no Carbon Tetrafluoride / Tetrafluoromethane CF4 Gas 99.999% Purity Electronic Grade no Semiconductor, ʻO ka pahuhopu nui o kā mākou hui, ʻo ia ke ola i kahi hoʻomanaʻo maikaʻi i nā mea kūʻai aku a pau, a hoʻokumu i kahi pilina aloha lōʻihi me nā mea kūʻai aku a me nā mea hoʻohana a puni ka honua.
Kūʻai Wela noKina CF4 a me ke Kinoea CF4, Ke kālele nei mākou i ka hāʻawi ʻana i ka lawelawe no kā mākou mea kūʻai aku ma ke ʻano he mea nui i ka hoʻoikaika ʻana i kā mākou pilina lōʻihi. ʻO kā mākou loaʻa mau ʻana o nā waiwai kiʻekiʻe me kā mākou lawelawe mua-kūʻai a ma hope o ke kūʻai aku e hōʻoiaʻiʻo ana i ka hoʻokūkū ikaika i kahi mākeke honua e ulu nei. Makemake mākou e hana pū me nā hoaaloha ʻoihana mai ka home a ma waho a hana i kahi wā e hiki mai ana maikaʻi.