Mea Hana Kina no Kina Carbon Tetrafluoride CF4 Electronic Gas

Wehewehe Pōkole:


Nā kikoʻī huahana

Nā Lepili Huahana

Ke koi nei kā mākou hui ma ke kulekele maikaʻi o "ka maikaʻi o ka huahana ke kumu o ke ola ʻana o ka ʻoihana; ʻo ka ʻoluʻolu o ka mea kūʻai aku ke kiko a me ka hopena o kahi ʻoihana; ʻo ka hoʻomaikaʻi mau ʻana ka hahai mau ʻana i nā limahana "a me ke kumu mau o "ka inoa mua, ka mea kūʻai mua" no ka mea hana Kina noKina Carbon Tetrafluoride CF4ʻO Electronic Gas, ke paipai aku nei mākou iā ʻoe e hoʻokaʻaʻike mai iā mākou no ka mea ke ʻimi nei mākou i nā hoa hana i loko o kā mākou ʻoihana. Ke maopopo nei iā ʻoe e ʻike ʻoe i ka hana ʻoihana me mākou ʻaʻole wale ka holomua akā ke loaʻa kālā pū kekahi. Ua mākaukau mākou e hāʻawi iā ʻoe i kāu mea e pono ai.
Ke koi nei kā mākou hui ma ke kulekele maikaʻi o "ka maikaʻi o ka huahana ke kumu o ke ola ʻana o ka ʻoihana; ʻo ka ʻoluʻolu o ka mea kūʻai aku ke kiko a me ka hopena o kahi ʻoihana; ʻo ka hoʻomaikaʻi mau ʻana ka hahai mau ʻana i nā limahana "a me ke kumu mau o "ka inoa mua, ka mea kūʻai mua" noCF4, Kina Carbon Tetrafluoride, ke manaʻolana nei mākou e hoʻokumu i kahi pilina ʻoihana maikaʻi a lōʻihi me kāu hui hanohano ma o kēia manawa kūpono, ma muli o ke kaulike, ka pōmaikaʻi like a me ka ʻoihana lanakila-lanakila mai kēia manawa a i ka wā e hiki mai ana. "ʻO kou ʻoluʻolu ko mākou hauʻoli".

Nā Palena ʻenehana

Nā kikoʻī 99.999%
ʻOkikene+ʻArgon ≤1ppm
Naikokene ≤4 ppm
Ka makū (H2O) ≤3 ppm
HF ≤0.1 ppm
CO ≤0.1 ppm
CO2 ≤1 ppm
SF6 ≤1 ppm
Nā Halocarbynes ≤1 ppm
Nā mea haumia āpau ≤10 ppm

ʻO ke kalapona tetrafluoride kahi hydrocarbon halogenated me ke ʻano kemikaCF4Hiki ke manaʻo ʻia he hydrocarbon halogenated, methane halogenated, perfluorocarbon, a i ʻole he hui inorganic. ʻO ke kalapona tetrafluoride he kinoea kala ʻole a ʻala ʻole, hoʻoheheʻe ʻole ʻia i ka wai, hoʻoheheʻe ʻia i loko o ka benzene a me ka chloroform. Paʻa ma lalo o ka mahana maʻamau a me ke kaomi, pale i nā oxidants ikaika, nā mea lapalapa a i ʻole nā ​​mea hiki ke puhi. ʻO ke kinoea ʻaʻole hiki ke puhi, e piʻi aʻe ke kaomi o loko o ka pahu ke hōʻike ʻia i ka wela kiʻekiʻe, a aia kahi pilikia o ka haki a me ka pahū. He paʻa kemika a ʻaʻole hiki ke lapalapa. ʻO ka mea hoʻohui metala ammonia-sodium wai wale nō ke hana ma ka mahana o ka lumi. ʻO ke kalapona tetrafluoride kahi kinoea e hoʻoulu ai i ka hopena ʻōmaʻomaʻo. He paʻa loa ia, hiki ke noho i ka lewa no ka manawa lōʻihi, a he kinoea ʻōmaʻomaʻo ikaika loa. Hoʻohana ʻia ke kalapona tetrafluoride i ke kaʻina hana etching plasma o nā kaapuni hoʻohui like ʻole. Hoʻohana ʻia hoʻi ia ma ke ʻano he kinoea laser, a hoʻohana ʻia i nā refrigerants haʻahaʻa haʻahaʻa, nā solvents, nā lubricants, nā mea insulating, a me nā coolants no nā mea ʻike infrared. ʻO ia ke kinoea etching plasma i hoʻohana nui ʻia ma ka ʻoihana microelectronics. He hui ia o ke kinoea tetrafluoromethane kiʻekiʻe-maʻemaʻe a me ke kinoea tetrafluoromethane kiʻekiʻe-maʻemaʻe a me ka oxygen kiʻekiʻe-maʻemaʻe. Hiki ke hoʻohana nui ʻia i loko o ka silicon, silicon dioxide, silicon nitride, a me ke aniani phosphosilicate. Hoʻohana nui ʻia ka etching o nā mea ʻili lahilahi e like me ka tungsten a me ka tungsten i ka hoʻomaʻemaʻe ʻili o nā mea uila, ka hana ʻana o nā cell solar, ka ʻenehana laser, ka hoʻomaʻalili haʻahaʻa-mahana, ka nānā ʻana i ka leak, a me ka detergent i ka hana ʻana o nā kaapuni paʻi. Hoʻohana ʻia ma ke ʻano he refrigerant haʻahaʻa-mahana a me ka ʻenehana etching maloʻo plasma no nā kaapuni i hoʻohui ʻia. Nā palekana no ka mālama ʻana: E mālama i loko o kahi hale kūʻai kinoea anuanu, ea ʻole. E mālama ʻia mai ke ahi a me nā kumu wela. ʻAʻole pono e ʻoi aku ka mahana o ka mālama ʻana ma mua o 30°C. Pono e mālama ʻia ma kahi kaʻawale mai nā mea ʻā a me nā oxidants maʻalahi (hiki ke puhi), a pale i ka mālama ʻana i hui pū ʻia. Pono e hoʻolako ʻia kahi mālama me nā lako lapaʻau pilikia leakage.

Noi:

① Mea hoʻomaʻalili:

I kekahi manawa hoʻohana ʻia ʻo Tetrafluoromethane ma ke ʻano he refrigerant haʻahaʻa haʻahaʻa.

  fdrgr ʻO Greg

② Ke kālai ʻana:

Hoʻohana ʻia ia i ka hana microhana uila wale nō a i ʻole i ka hui pū ʻana me ka oxygen ma ke ʻano he plasma etchant no ka silicon, silicon dioxide, a me ka silicon nitride.

dsgre rgg

Pūʻolo maʻamau:

Huahana Kāpona Tetrafluoride CF4
Ka nui o ka pūʻolo Paukū 40Ltr Paukū 50Ltr  
Hoʻopiha i ke kaumaha ʻupena/Cyl 30Kgs 38Kgs  
Ka nui i hoʻouka ʻia i loko o ka ipu 20' 250 Cyls 250 Cyls
Kaumaha ʻupena holoʻokoʻa 7.5 Tons 9.5 Tons
Kaumaha Tare o ka paukūʻolokaʻa 50Kgs 55Kgs
Kiwikā CGA 580

Pōmaikaʻi:

①High maemae, hale hou loa;

②Mea hana palapala hōʻoia ISO;

③Hoʻouna wikiwiki;

ʻŌnaehana loiloi pūnaewele no ka kaohi maikaʻi i kēlā me kēia ʻanuʻu;

⑤Kūpono kiʻekiʻe a me ke kaʻina hana meticulous no ka lawelawe ʻana i ka cylinder ma mua o ka hoʻopiha ʻana;Ke koi nei kā mākou hui ma ke kulekele maikaʻi o "ka maikaʻi o ka huahana ke kumu o ke ola ʻana o ka ʻoihana; ʻo ka ʻoluʻolu o ka mea kūʻai aku ke kiko a me ka hopena o kahi ʻoihana; ʻo ka hoʻomaikaʻi mau ʻana ka hahai mau ʻana i nā limahana" a me ke kumu mau o "ka inoa mua, ka mea kūʻai mua" no ka mea hana Kina no Kina Carbon Tetrafluoride CF4 Electronic Gas, Paipai mākou iā ʻoe e hoʻokaʻaʻike mai no ka mea ke ʻimi nei mākou i nā hoa hana i loko o kā mākou ʻoihana. Ke maopopo nei iā ʻoe e ʻike ʻoe i ka hana ʻoihana me mākou ʻaʻole wale ka holomua akā ke loaʻa kālā pū kekahi. Ua mākaukau mākou e hāʻawi iā ʻoe i kāu mea e pono ai.
ʻO ka mea hana Kina no Kina Carbon Tetrafluoride, CF4, ke manaʻolana nei mākou e hoʻokumu i kahi pilina ʻoihana maikaʻi a lōʻihi me kāu hui hanohano ma o kēia manawa kūpono, ma muli o ke kaulike, ka pōmaikaʻi like a me ka ʻoihana lanakila-lanakila mai kēia manawa a hiki i ka wā e hiki mai ana. "ʻO kou ʻoluʻolu ko mākou hauʻoli".


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