Hale Hana Kina no ka mea hoʻolako maikaʻi loa ʻo Tetrafluoride CF4 Gas Mai Kina

Wehewehe Pōkole:


Nā kikoʻī huahana

Nā Lepili Huahana

Ke hoʻomau nei i ka "Kūlana kiʻekiʻe, Hoʻouna koke, Kumukūʻai Hoʻouka", ua hoʻokumu mākou i ka laulima lōʻihi me nā mea kūʻai mai nā ʻāina ʻē a me ka home a loaʻa nā manaʻo nui o nā mea kūʻai aku hou a me nā mea kahiko no ka Hale Hana Kina no ka Mea Hoʻolako Maikaʻi Loa ʻo Tetrafluoride CF4 Gas Mai Kina, Inā makemake ʻoe i kekahi o kā mākou huahana a me nā lawelawe, e ʻoluʻolu e kāhea mai iā mākou. Makemake mākou e pane iā ʻoe i loko o 24 mau hola ma hope o ka loaʻa ʻana o kāu noi a e hoʻoulu i nā ʻano maikaʻi like ʻole a me ka ʻoihana ma kahi o ka wā lōʻihi.
Ke hoʻomau nei i ka "Kūlana kiʻekiʻe, Hoʻouna koke, Kumukūʻai Hoʻouka", i kēia manawa ua hoʻokumu mākou i ka laulima lōʻihi me nā mea kūʻai aku mai nā ʻāina like ʻole a me ka home a loaʻa nā manaʻo nui o nā mea kūʻai aku hou a me nā mea kahiko noKinoea CF4 Kina a me ke Kinoea Carbon Tetrafluoride, Inā loaʻa kekahi huahana i kāu koi, e ʻoluʻolu e hoʻokaʻaʻike mai iā mākou. Ke maopopo nei iā mākou e loaʻa ana kāu nīnau a koi paha i ka nānā koke ʻana, nā huahana kiʻekiʻe, nā kumukūʻai makemake a me ka ukana haʻahaʻa. Hoʻokipa maikaʻi i nā hoaaloha ma ka honua holoʻokoʻa e kelepona mai a i ʻole e kipa mai, e kūkākūkā i ka laulima no kahi wā e hiki mai ana!

Nā Palena ʻenehana

Nā kikoʻī 99.999%
ʻOkikene+ʻArgon ≤1ppm
Naikokene ≤4 ppm
Ka makū (H2O) ≤3 ppm
HF ≤0.1 ppm
CO ≤0.1 ppm
CO2 ≤1 ppm
SF6 ≤1 ppm
Nā Halocarbynes ≤1 ppm
Nā mea haumia āpau ≤10 ppm

ʻO ke kalapona tetrafluoride kahi hydrocarbon halogenated me ke ʻano kemika CF4. Hiki ke manaʻo ʻia he hydrocarbon halogenated, methane halogenated, perfluorocarbon, a i ʻole he hui inorganic. ʻO ke kalapona tetrafluoride kahi kinoea ʻaʻohe kala a ʻala ʻole, hoʻoheheʻe ʻole ʻia i ka wai, hoʻoheheʻe ʻia i ka benzene a me ka chloroform. Paʻa ma lalo o ka mahana maʻamau a me ke kaomi, pale i nā oxidants ikaika, nā mea lapalapa a i ʻole nā ​​mea hiki ke puhi. ʻO ke kinoea ʻaʻole hiki ke puhi, e hoʻonui ʻia ke kaomi o loko o ka pahu ke hōʻike ʻia i ka wela kiʻekiʻe, a aia kahi pilikia o ka haki a me ka pahū. He paʻa kemika a ʻaʻole hiki ke lapalapa. ʻO ka mea hana metala ammonia-sodium wai wale nō ke hana ma ka mahana o ka lumi. ʻO ke kalapona tetrafluoride kahi kinoea e hoʻoulu ai i ka hopena ʻōmaʻomaʻo. He paʻa loa ia, hiki ke noho i ka lewa no ka manawa lōʻihi, a he kinoea ʻōmaʻomaʻo ikaika loa. Hoʻohana ʻia ke kalapona tetrafluoride i ke kaʻina hana etching plasma o nā kaapuni hoʻohui like ʻole. Hoʻohana ʻia hoʻi ia ma ke ʻano he kinoea laser, a hoʻohana ʻia i loko o nā refrigerants haʻahaʻa haʻahaʻa, nā solvents, nā lubricants, nā mea hoʻokaʻawale, a me nā coolants no nā mea ʻike infrared. ʻO ia ka kinoea etching plasma i hoʻohana nui ʻia ma ka ʻoihana microelectronics. He hui ia o ke kinoea tetrafluoromethane kiʻekiʻe-purity a me ke kinoea tetrafluoromethane kiʻekiʻe-purity a me ka oxygen kiʻekiʻe-purity. Hiki ke hoʻohana nui ʻia i loko o ka silicon, silicon dioxide, silicon nitride, a me ke aniani phosphosilicate. Hoʻohana nui ʻia ka etching o nā mea ʻili lahilahi e like me ka tungsten a me ka tungsten i ka hoʻomaʻemaʻe ʻili o nā mea uila, ka hana ʻana o nā cell solar, ka ʻenehana laser, ka refrigeration haʻahaʻa haʻahaʻa, ka nānā ʻana i ka leak, a me ka detergent i ka hana ʻana o nā kaapuni paʻi. Hoʻohana ʻia ma ke ʻano he refrigerant haʻahaʻa haʻahaʻa a me ka ʻenehana etching maloʻo plasma no nā kaapuni i hoʻohui ʻia. Nā palekana no ka mālama ʻana: E mālama i loko o kahi hale kūʻai kinoea anuanu, ventilated, ʻaʻole hiki ke puhi. E mālama mai ke ahi a me nā kumu wela. ʻAʻole pono e ʻoi aku ka mahana o ka mālama ʻana ma mua o 30°C. Pono e mālama ʻokoʻa ʻia mai nā mea ʻā maʻalahi (hiki ke puhi) a me nā mea hoʻoheheʻe ʻia, a pale i ka mālama ʻana i nā mea like ʻole. Pono e hoʻolako ʻia kahi mālama me nā lako hana lapaʻau ulia pōpilikia liki.

Noi:

① Mea hoʻomaʻalili:

I kekahi manawa hoʻohana ʻia ʻo Tetrafluoromethane ma ke ʻano he refrigerant haʻahaʻa haʻahaʻa.

  fdrgr ʻO Greg

② Ke kālai ʻana:

Hoʻohana ʻia ia i ka hana microhana uila wale nō a i ʻole i ka hui pū ʻana me ka oxygen ma ke ʻano he plasma etchant no ka silicon, silicon dioxide, a me ka silicon nitride.

dsgre rgg

Pūʻolo maʻamau:

Huahana Kāpona Tetrafluoride CF4
Ka nui o ka pūʻolo Paukū 40Ltr Paukū 50Ltr  
Hoʻopiha i ke kaumaha ʻupena/Cyl 30Kgs 38Kgs  
Ka nui i hoʻouka ʻia i loko o ka ipu 20' 250 Cyls 250 Cyls
Kaumaha ʻupena holoʻokoʻa 7.5 Tons 9.5 Tons
Kaumaha Tare o ka paukūʻolokaʻa 50Kgs 55Kgs
Kiwikā CGA 580

Pōmaikaʻi:

①High maemae, hale hou loa;

②Mea hana palapala hōʻoia ISO;

③Hoʻouna wikiwiki;

ʻŌnaehana loiloi pūnaewele no ka kaohi maikaʻi i kēlā me kēia ʻanuʻu;

⑤Kūpono kiʻekiʻe a me ke kaʻina hana meticulous no ka lawelawe ʻana i ka cylinder ma mua o ka hoʻopiha ʻana;Ke hoʻomau nei i ka "Kūlana kiʻekiʻe, Hoʻouna koke, Kumukūʻai Hoʻouka", ua hoʻokumu mākou i ka laulima lōʻihi me nā mea kūʻai mai nā ʻāina ʻē a me ka home a loaʻa nā manaʻo nui o nā mea kūʻai aku hou a me nā mea kahiko no ka Hale Hana Kina no ka Mea Hoʻolako Maikaʻi Loa ʻo Tetrafluoride CF4 Gas Mai Kina, Inā makemake ʻoe i kekahi o kā mākou huahana a me nā lawelawe, e ʻoluʻolu e kāhea mai iā mākou. Makemake mākou e pane iā ʻoe i loko o 24 mau hola ma hope o ka loaʻa ʻana o kāu noi a e hoʻoulu i nā ʻano maikaʻi like ʻole a me ka ʻoihana ma kahi o ka wā lōʻihi.
Hale Hana Kina noKinoea CF4 Kina a me ke Kinoea Carbon Tetrafluoride, Inā loaʻa kekahi huahana i kāu koi, e ʻoluʻolu e hoʻokaʻaʻike mai iā mākou. Ke maopopo nei iā mākou e loaʻa ana kāu nīnau a koi paha i ka nānā koke ʻana, nā huahana kiʻekiʻe, nā kumukūʻai makemake a me ka ukana haʻahaʻa. Hoʻokipa maikaʻi i nā hoaaloha ma ka honua holoʻokoʻa e kelepona mai a i ʻole e kipa mai, e kūkākūkā i ka laulima no kahi wā e hiki mai ana!


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