Kāpona Tetrafluoride (CF4)

Nā Palena ʻenehana

ʻO ke kalapona tetrafluoride kahi hydrocarbon halogenated me ke ʻano kemika CF4. Hiki ke manaʻo ʻia he hydrocarbon halogenated, methane halogenated, perfluorocarbon, a i ʻole he hui inorganic. ʻO ke kalapona tetrafluoride kahi kinoea ʻaʻohe kala a ʻala ʻole, hoʻoheheʻe ʻole ʻia i ka wai, hoʻoheheʻe ʻia i ka benzene a me ka chloroform. Paʻa ma lalo o ka mahana maʻamau a me ke kaomi, pale i nā oxidants ikaika, nā mea lapalapa a i ʻole nā ​​mea hiki ke puhi. ʻO ke kinoea ʻaʻole hiki ke puhi, e hoʻonui ʻia ke kaomi o loko o ka pahu ke hōʻike ʻia i ka wela kiʻekiʻe, a aia kahi pilikia o ka haki a me ka pahū. He paʻa kemika a ʻaʻole hiki ke lapalapa. ʻO ka mea hana metala ammonia-sodium wai wale nō ke hana ma ka mahana o ka lumi. ʻO ke kalapona tetrafluoride kahi kinoea e hoʻoulu ai i ka hopena ʻōmaʻomaʻo. He paʻa loa ia, hiki ke noho i ka lewa no ka manawa lōʻihi, a he kinoea ʻōmaʻomaʻo ikaika loa. Hoʻohana ʻia ke kalapona tetrafluoride i ke kaʻina hana etching plasma o nā kaapuni hoʻohui like ʻole. Hoʻohana ʻia hoʻi ia ma ke ʻano he kinoea laser, a hoʻohana ʻia i loko o nā refrigerants haʻahaʻa haʻahaʻa, nā solvents, nā lubricants, nā mea hoʻokaʻawale, a me nā coolants no nā mea ʻike infrared. ʻO ia ka kinoea etching plasma i hoʻohana nui ʻia ma ka ʻoihana microelectronics. He hui ia o ke kinoea tetrafluoromethane kiʻekiʻe-purity a me ke kinoea tetrafluoromethane kiʻekiʻe-purity a me ka oxygen kiʻekiʻe-purity. Hiki ke hoʻohana nui ʻia i loko o ka silicon, silicon dioxide, silicon nitride, a me ke aniani phosphosilicate. Hoʻohana nui ʻia ka etching o nā mea ʻili lahilahi e like me ka tungsten a me ka tungsten i ka hoʻomaʻemaʻe ʻili o nā mea uila, ka hana ʻana o nā cell solar, ka ʻenehana laser, ka refrigeration haʻahaʻa haʻahaʻa, ka nānā ʻana i ka leak, a me ka detergent i ka hana ʻana o nā kaapuni paʻi. Hoʻohana ʻia ma ke ʻano he refrigerant haʻahaʻa haʻahaʻa a me ka ʻenehana etching maloʻo plasma no nā kaapuni i hoʻohui ʻia. Nā palekana no ka mālama ʻana: E mālama i loko o kahi hale kūʻai kinoea anuanu, ventilated, ʻaʻole hiki ke puhi. E mālama mai ke ahi a me nā kumu wela. ʻAʻole pono e ʻoi aku ka mahana o ka mālama ʻana ma mua o 30°C. Pono e mālama ʻokoʻa ʻia mai nā mea ʻā maʻalahi (hiki ke puhi) a me nā mea hoʻoheheʻe ʻia, a pale i ka mālama ʻana i nā mea like ʻole. Pono e hoʻolako ʻia kahi mālama me nā lako hana lapaʻau ulia pōpilikia liki.

Noi:

① Mea hoʻomaʻalili:

I kekahi manawa hoʻohana ʻia ʻo Tetrafluoromethane ma ke ʻano he refrigerant haʻahaʻa haʻahaʻa.

② Ke kālai ʻana:

Hoʻohana ʻia ia i ka hana microhana uila wale nō a i ʻole i ka hui pū ʻana me ka oxygen ma ke ʻano he plasma etchant no ka silicon, silicon dioxide, a me ka silicon nitride.

Pūʻolo maʻamau:

Pōmaikaʻi:

①High maemae, hale hou loa;

②Mea hana palapala hōʻoia ISO;

③Hoʻouna wikiwiki;

ʻŌnaehana loiloi pūnaewele no ka kaohi maikaʻi i kēlā me kēia ʻanuʻu;

⑤Kūpono kiʻekiʻe a me ke kaʻina hana meticulous no ka lawelawe ʻana i ka cylinder ma mua o ka hoʻopiha ʻana;